US3728246A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Device for applying thin films to articles
Assignee: Individual
•
Filing: 1971-08-25
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Granted: 1973-04-17
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Expires: 1991-08-25
Abstract
Abstract The cathode sputtered by ion bombardment and the anode have a common axis of symmetry in the vacuumized gas-discharge chamber. The anode is formed by two tubes of the same outside diameter. These tubes are installed along the axis of symmetry with a gap between the ends, said gap allowing the passage of the sputtered material of the cathode onto the article installed in the gap. The gas-discharge chamber is located in a magnetic field whose lines of force coincide in direction with the axis of symmetry. This magnetic field is intended to produce a low-pressure discharge in the chamber.
Inventors
- 👤 N Kervalishvili
- 👤 V Kortkhondzhia
- 👤 E Barkhudarov
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 03:56
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-04-16 | 1976-10-16 | 1977-04-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-04-16 | 1980-10-16 | 1981-04-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-04-16 | 1984-10-16 | 1985-04-17 | $7700.00 | Window Closed / Lapsed |