US3728154A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Semiconductor wafer cleaning
Assignee: Individual
•
Filing: 1970-09-14
•
Granted: 1973-04-17
•
Expires: 1990-09-14
Abstract
Abstract A PROCESS FOR CLEANING SEMICONDUCTOR SURFACES USING AN AQUEOUS WASH SOLUTION OF DILUTE SULFURIC ACID. THE DILUTE ACID IS MADE WITH ULTRA CLEAN DEIONIZED WATER. THE SEMICONDUCTOR SURFACES TO BE CLEANED ARE DIPPED IN AND OUT OF THE SOLUTION IMMEDIATELY AFTER THE SOLUTION IS FORMED.
Inventors
- 👤 C Suzuki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 06:02
CPC Classifications
H; H10; H10P; H10P70/00; H10P70/10; H10P70/15
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1976-04-16 | 1976-10-16 | 1977-04-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1980-04-16 | 1980-10-16 | 1981-04-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1984-04-16 | 1984-10-16 | 1985-04-17 | $7700.00 | Window Closed / Lapsed |