US3705055A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of descumming photoresist patterns
Assignee: AT&T Inc
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Filing: 1970-09-18
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Granted: 1972-12-05
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Expires: 1990-09-18
Abstract
Abstract RESIDUAL PORTIONS OF PHOTORESIST ARE REMOVED FROM AREAS OF A PATTERN WHICH ARE TO BE FREE OF PHOTORESIST. THE REMOVAL OF "DESCUMMING" IS ACCOMPLISHED BY SUBJECTING SUBSTRATES WITH PATTERNED COATINGS OF PHOTORESIST TO AN OXIDIZING MEDIUM, SUCH AS OXYGEN PLASMA, FOR A BRIEF PERIOD. THE RESIDUAL PHOTORESIST OR "SCUM" IS REMOVED WHILE THE DESIRED PHOTORESIST IS REDUCED IN THICKNESS. THE TIME OF OXIDATION IS LIMITED SO THAT THE DESIRED PHOTORESIST IS NOT MADE EXCESSIVELY THIN.
Inventors
- 👤 Gary Lee Christensen
- 👤 Donald Henry Gittelman
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 00:51
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/40; H; H10; H10W; H10W74/00; H10W74/40; H10W74/47; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/948; Y10S438/949
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-12-05 | 1976-06-05 | 1976-12-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-12-05 | 1980-06-05 | 1980-12-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-12-05 | 1984-06-05 | 1984-12-05 | $7700.00 | Window Closed / Lapsed |