US3704987A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Device for the epitaxialy deposition of semiconductor material
Assignee: Telefunken Electronic GmbH
•
Filing: 1970-06-05
•
Granted: 1972-12-05
•
Expires: 1990-06-05
Abstract
Abstract A device for the epitaxial deposition of semiconductor material on a substrate, which device comprises two containers one located inside the other, the substrate being provided inside one of the containers and gas necessary for the epitaxial deposition being introduced into the containers in such a manner that a substantially vertical flow of gas is formed in each of the containers but the direction of flow of the gas in one container is opposite to the direction of flow of the gas in the other container.
Inventors
- 👤 Heinz-Herbert Arndt
- 👤 Edwin Nosch
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 12:36
CPC Classifications
C; C30; C30B; C30B25/00; C30B25/02; C30B25/14
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
197 words
A device for the epitaxial deposition of semiconductor material on a substrate, said device comprising a first vertical container, a second vertical container inside the first container, means for introducing a gas for epitaxial deposition on the substrate into said second container, said gas introducing means including a gas pipe which passes through the bottom of the second container and extends to adjacent the upper end of said second container, said gas pipe having an outlet adjacent to said upper end of the second container, first means vertically displaced from said outlet in a downward direction for allowing said gas to pass out of said second container into said first container so that said gas flows in said second container in a substantially vertical direction and toward said first means, second means vertically displaced from said first means in the direction of said outlet for allowing said gas to pass out of said first container so that said gas flows in said first container in a substantially vertical direction opposite to that in said second container, and means for supporting at least one substrate within the path of one of said substantially vertical flows for deposition thereon.
Claim 2
Independent Claim
197 words
A device for the epitaxial deposition of semiconductor material on a substrate, said device comprising a first vertical container, a second vertical container inside the first container, means for introducing a gas for epitaxial deposition on the substrate into said second container, said gas introducing means including a gas pipe which passes through the bottom of the second container and extends to adjacent the upper end of said second container, said gas pipe having an outlet adjacent to said upper end of the second container, first means vertically displaced from said outlet in a downward direction for allowing said gas to pass out of said second container into said first container so that said gas flows in said second container in a substantially vertical direction and toward said first means, second means vertically displaced from said first means in the direction of said outlet for allowing said gas to pass out of said first container so that said gas flows in said first container in a substantially vertical direction opposite to that in said second container, and means for supporting at least one substrate within the path of one of said substantially vertical flows for deposition thereon.
Claim 3
Dependent Claim
89 words
A dEvice as claimed in claim 1, in which said second container includes a cylindrical portion and an upper and lower bell-shaped housing portion extending one from each end of said cylindrical portion, said cylindrical portion includes said means for supporting the substrates, and said bell-shaped housing portions have a volume which is at least half to twice as great as the volume of said cylindrical portion, whereby the gas flow is calmed in such manner that a uniform flow with minimum possible velocity is developed at the substrate.
Claim 4
Dependent Claim
14 words
A device as claimed in claim 1, in which the second container is rotatable.
Claim 5
Dependent Claim
19 words
A device as claimed in claim 1, in which the two containers are arranged concentrically around the gas pipe.
Claim 6
Dependent Claim
35 words
A device as claimed in claim 1, in which said second means for allowing said gas to pass out of said first container includes an aperture provided in the upper end of the first container.
Claim 7
Dependent Claim
37 words
A device as claimed in claim 1, in which said first means for allowing said gas to pass out of said second container into said first container includes apertures provided in the bottom of the second container.
Claim 8
Dependent Claim
25 words
A device as claimed in claim 1, in which the means for supporting the substrate is mounted on the outer wall of the second container.
Claim 9
Dependent Claim
25 words
A device as claimed in claim 1, in which the means for supporting the substrate is mounted on the inner wall of the second container.
Claim 10
Dependent Claim
18 words
A device as claimed in claim 1, in which the first container is surrounded by a heating coil.
Claim 11
Dependent Claim
18 words
A device as claimed in claim 1, in which the second container is surrounded by a heating coil.
Claim 12
Dependent Claim
64 words
A device as claimed in claim 4 in which said second means for allowing said gas to pass out of said first container includes an aperture provided in the upper end of said first container, and said first means for allowing said gas to pass out of said second container into said first container includes apertures provided in the bottom of said second container.
Claim 13
Dependent Claim
66 words
A device as claimed in claim 11 wherein said second container includes a cylindrical portion and an upper and lower bell-shaped housing portion extending one from each end of said cylindrical portion, said cylindrical portion includes said means for supporting the substrates, and said bell-shaped housing portions have a volume which is at least half to twice as great as the volume of said cylindrical portion.
References Cited (Backward Citations)
DE1056449B
Cited
US3246627A
Cited
US3189494A
Cited
US3338761A
Cited
US3464846A
Cited
US3424629A
Cited
US3460510A
Cited
US3384049A
Cited
US3594227A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-12-05 | 1976-06-05 | 1976-12-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-12-05 | 1980-06-05 | 1980-12-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-12-05 | 1984-06-05 | 1984-12-05 | $7700.00 | Window Closed / Lapsed |