Composition for developing photopolymerizable lithographic plate elements comprising a developer base agent,an ink-receptivity-affording agent and a desensitizer
Abstract
Abstract DEVELOPER COMPOSITION FOR A LITHOGRAPHIC PLATE WHICH IS TO BE USED FOR THE PHOTOPOLYMERIZED LAYER OBTAINED BY EXPOSING TO ACTINIC LIGHT A SELECTED AREA OF A COATING OF A PHOTOPOLYMERIZABLE LAYER FROM A SPECIFIED PHOTOSENSITIZING SOLUTION CONSISTING OF (I) A PHOTOPOLYMERIZABLE COMPONENT COMPRISING AN UNSATURATED POLYESTER, AT LEAST ONE ETHYLENICALLY UNSATURATED MONOMER, A PHOTOPOLYMERIZATION INITIATOR AND A THERMAL POLYMERIZATION INHIBITOR AND (II) AT LEAST ONE SOLVENT. SAID DEVELOPER COMPOSITION CONSISTS OF AT LEAST ONE DEVELOPER BASE AGENT, AT LEAST ONE INK-RECEPTIVITY AFFORDING AGENT, AT LEAST ONE DESENSITIZER AND, IF NECESSARY, AT LEAST ONE ETCHING AGENT AND ENABLES TO ATTAIN EFFECTS OF INK-RECEPITIVITY, DENSENSITIZATION AND ETCHING SIMULTANEOUSLY WITH DEVELOPMENT BY ONE TIME APPLICATION OF ONE SOLUTION.
Inventors
- 👤 Hisaaki Fukui
- 👤 Taketoshi Araki
Bibliographic Details
Claims Analysis
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