US3697450A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for producing resistance films
Assignee: Fujifilm Holdings Corp
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Filing: 1969-06-23
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Granted: 1972-10-10
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Expires: 1989-06-23
Abstract
Abstract A RESISTANCE FILM AND PROCESS THEREFOR, INCLUDING FORMING A DISPERSION OF (1) A SOLUTION OF AN ORGANIC SOLVENTSOLUBLE PLASTIC OF A SOFTENING POINT GREATER THAN 80*C., (2) A CONDUCTIVE SUBSTANCE HAVING A VOLUME RESISTIVITY OF LESS THAN 10-1$ CM. AND (3) AN INORGANIC SILICO-CONTAINING MATERIAL OF A VOLUME RESISTIVITY OF MORE THAN 10-4$ CM., CASTING A FILM OF THE DISPERSION, AND DRYING THE FILM.
Inventors
- 👤 Haruo Takenaka
- 👤 Toshiaki Okiyama
- 👤 Nobuo Hiratsuka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 14:58
CPC Classifications
H; H01; H01C; H01C17/00; H01C17/06; H01C17/065; H01C17/06506; H01B; H01B1/00; H01B1/20; H01B1/24
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-10-10 | 1976-04-10 | 1976-10-10 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-10-10 | 1980-04-10 | 1980-10-10 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-10-10 | 1984-04-10 | 1984-10-10 | $7700.00 | Window Closed / Lapsed |