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US3697338A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of manufacturing semiconductor devices

Assignee: Hitachi Ltd
•
Filing: 1971-02-17
•
Granted: 1972-10-10
•
Expires: 1991-02-17
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Abstract

Abstract A METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES BY SOLID-SOLID DIFFUSION WHEREIN A GROUP III-VI COMPOUND SUCH AS GA2S3, AL2S3 ETC. IS DEPOSITED ON A SUBSTRATE OF A GROUP III-V COMPOUND SEMICONDUCTOR SUCH AS GAAS, GAP, ETC., AND THE GROUP VI ELEMENT IS DIFFUSED INTO THE GROUP III-IV COMPOUND SEMICONDUCTOR.

Inventors

  • 👤 Shojiro Asai
  • 👤 Motohisa Hirao
  • 👤 Eiichi Maruyama

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 21:51
CPC Classifications
H; H10; H10P; H10P32/00; H10P32/10; H10P32/14; H10P32/17; H10P32/174; H10P95/00; Y; Y10; Y10S; Y10S148/00; Y10S148/022; Y10S148/043; Y10S148/118; Y10S252/00; Y10S252/95; Y10S252/951

Claims Analysis

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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-10-10 1976-04-10 1976-10-10 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-10-10 1980-04-10 1980-10-10 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-10-10 1984-04-10 1984-10-10 $7700.00 Window Closed / Lapsed

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