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US3691053A Expired / Lapsed US ⏱️ 0.0 years remaining

Getter-sputtering apparatus

Assignee: Bangor University
•
Filing: 1969-12-29
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Granted: 1972-09-12
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Expires: 1989-12-29
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Abstract

Abstract Apparatus and method for getter-sputtering. Material is sputtered from a cathode onto a substrate at a low pressure in an inert atmosphere. Sputtering is effected in a sputter space to which there is access of gas only by way of a gettering antechamber while sputtering is taking place. The sputter space may be arranged co-axially within the gettering space either in a planar arrangement or an arrangement of co-axial chamber with a dividing wall. Alternatively, the gettering chamber may be arranged above the sputter chamber.

Inventors

  • 👤 David W F James
  • 👤 David O Spiller
  • 👤 Harvey D Coltman

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 15:18
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/56; C23C14/564; C23C14/34; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-09-12 1976-03-13 1976-09-12 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-09-12 1980-03-13 1980-09-12 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-09-12 1984-03-13 1984-09-12 $7700.00 Window Closed / Lapsed

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