Temperature monitoring apparatus

Claim 2

A monitoring Apparatus comprising: a first electrolytic plating cell capable of plating at a predetermined rate; a source of electrical energy for applying an electrical current to said first cell; a thermistor controlling the application of electrical current to said first cell, said thermistor decreasing in electrical resistance upon increase of ambient temperature, thereby causing an increase of plating of said first cell upon increase of the ambient temperature; and adjustable means electrically connected with said first cell and said thermistor, said adjustable means capable of being adjusted at a predetermined ambient temperature to apply substantially zero electric potential to said first cell.

Claim 3

Apparatus as defined in claim 1 wherein: said adjustable means including a variable resistor, said variable resistor being adjustable to a plurality of ambient temperatures so that the electrical potential that is applied to said first cells is zero in each instance.

Claim 4

Apparatus as defined in claim 1 including: tampering indicating means associated with said source, a visual indicating means actuatable by said tampering indicating means, upon removing said source from the electrical conductive relationship with said first cell said tampering indicating means causes actuation of said visual indicating means.

Claim 5

A monitoring apparatus comprising: a source of electrical energy; a first circuit including a first electrolytic plating cell capable of plating at a predeterminable rate, said source supplying electrical energy to said first circuit, a first thermistor located within said first circuit controlling the application of electrical energy to said first cell, a variable resistor located within said first circuit cooperating with said first thermistor, said variable resistor being adjustable in view of an established resistance determined by a particular ambient temperature to apply zero electrical current to said first cell; a second circuit including a second electrolytic plating cell capable of deplating at a predetermined rate, said source supplying electrical energy to said second circuit, a first transistor located within said second circuit to effect a constant application of electrical current to said second cell upon the ambient temperature exceeding a predetermined value range, a second thermistor located within said second circuit controlling the application of electric potential to said first transistor a second transistor located within said second circuit being electrically conductive upon complete deplating of said second cell, said second transistor causing activation of a visual indicator; a third circuit including a third electrolytic plating cell capable of plating at a predeterminable rate, said source supplying electrical energy to said third circuit, said third cell being activated upon activation of said source, said third cell being deactivatable by completion of deplating of said second cell; capable of plating at a predeterminable rate, a constant value of electric current being supplied through said fourth cell being activated upon activation of said source, said fourth cell only being deactivated by deactivation of said source; and tampering indicating means associated with said source, a visual indicating means actuatable by said tampering indicating means, upon removing said source from the electrical conductive relationship with said first cell said tampering indicating means causes actuation of said visual indicating means.

Claim 6

A monitoring apparatus comprising: a source of electrical energy; a first circuit including a first electrolytic plating cell capable of plating at a predeterminable rate, said source supplying electrical energy to said first circuit, a first thermistor located within said first circuit controlling the application of electrical energy to said first cell, a variable resistor located within said first circuit cooperating with said first thermistor, said variable resistor being adjustable in view of an established resistance determined by a particular ambient temperature to apply zero electrical current to said first cell; a second circuit including a second electrolytic plating cell capable of deplating at a predetermined rate, said source supplying electrical energy to said second circuit, a first transistor located within said second circuit to effect a constant application of electrical current to said second cell upon the ambient temperature exceeding a predetermined value range, a second thermistor located within said second circuit controlling the application of electric potential to said first transistor a second transistor located within said second circuit being electrically conductive upon complete deplating of said second cell, said second transistor causing activation of a visual indicator; a third circuit including a third electrolytic plating cell capable of plating at a predeterminable rate, said source supplying electrical energy to said third circuit, said third cell being activated upon activation of said source, said third cell being deactivatable by completion of deplating of said second cell; capable of plating at a predeterminable rate, a constant value of electric current being supplied through said fourth cell being activated upon activation of said source, said fourth cell only being deactivated by deactivation of said source; and tampering indicating means associated with said source, a visual indicating means actuatable by said tampering indicating means, upon removing said source from the electrical conductive relationship with said first cell said tampering indicating means causes actuation of said visual indicating means.

Claim 7

A monitoring apparatus comprising: a first electrolytic plating cell capable of plating at a predetermined rate; a source of electrical energy for applying an electrical current to said first cell; a thermistor controlling the application of electrical current to said first cell, said thermistor decreasing in electrical resistance upon increase of ambient temperature, thereby causing an increase of plating of said first cell upon increase of the ambienT temperature; a second electrolytic plating cell capable of deplating at a predeterminable rate; a source of electrical energy for supplying an electrical current to said second cell; and first means to effect deplating of said second cell upon the ambient temperature exceeding a predetermined value range.

Claim 8

A monitoring apparatus comprising: a first electrolytic plating cell capable of plating at a predetermined rate; a source of electrical energy for applying an electrical current to said first cell; a thermistor controlling the application of electrical current to said first cell, said thermistor decreasing in electrical resistance upon increase of ambient temperature, thereby causing an increase of plating of said first cell upon increase of the ambienT temperature; a second electrolytic plating cell capable of deplating at a predeterminable rate; a source of electrical energy for supplying an electrical current to said second cell; and first means to effect deplating of said second cell upon the ambient temperature exceeding a predetermined value range.

Claim 9

Apparatus as defined in claim 5 wherein: said first means includes a first transistor assembly, said first transistor assembly effecting a steady application of electrical current to said second cell upon the ambient temperature exceeding said value range; and said first means further including a temperature indicating means to effect operation of said first transistor assembly.

Claim 10

Apparatus as defined in claim 6 wherein: said temperature indicating means includes a first thermistor assembly, said first thermistor assembly causing operation of said first transistor assembly upon sufficient increase of the ambient temperature.

Claim 11

Apparatus as defined in claim 7 wherein: said temperature indicating means further includes a second thermistor assembly causing operation of said first transistor assembly upon sufficient decrease of ambient temperature.

Claim 12

Apparatus as defined in claim 8 including: visual indicating means operable by said second plating cell upon complete deplating of said second cell.

Claim 13

Apparatus as defined in claim 9 wherein: said visual indicating means being operated by a second transistor assembly.

Claim 14

Apparatus as defined in claim 10 wherein: said second transistor assembly including a second transistor and a silicon diode rectifier, said second transistor causing actuation of said rectifier resulting in activation of said visual indicating means.

Claim 15

Apparatus as defined in claim 11 wherein: said visual indicating means includes a flash bulb, upon activation of said flash bulb an observable heat-sensitive paper is discolored.

Claim 16

A monitoring apparatus comprising: a first electrolytic plating cell capable of plating at a predetermined rate; a source of electrical energy for applying an electrical current to said first cell; a thermistor controlling the application of electrical current to said first cell, said thermistor decreasing in electrical resistance upon increase of ambient temperature, thereby causing an increase of plating of said first cell upon increase of the ambient temperature; a second electrolytic plating cell capable of deplating at a predeterminable rate; a source of electrical energy for supplying an electrical current to said second cell; first means to effect deplating of said second cell upon the ambient temperature exceeding a predetermined value range; a third electrolytic plating cell capable of plating at a predeterminable rate, said third cell being activated immediately upon activation of the entire monitoring apparatus; and second means supplying a constant value electrical potential to said third cell, said second means being deactivated from supplying electrical current to said third cell upon completion of the deplating of said second cell.

Claim 17

A monitoring apparatus comprising: a first electrolytic plating cell capable of plating at a predetermined rate; a source of electrical energy for applying an electrical current to said first cell; a thermistor controlling the application of electrical current to said first cell, said thermistor decreasing in electrical resistance upon increase of ambient temperature, thereby causing an increase of plating of said first cell upon increase of the ambient temperature; a second electrolytic plating cell capable of deplating at a predeterminable rate; a source of electrical energy for supplying an electrical current to said second cell; first means to effect deplating of said second cell upon the ambient temperature exceeding a predetermined value range; a third electrolytic plating cell capable of plating at a predeterminable rate, said third cell being activated immediately upon activation of the entire monitoring apparatus; and second means supplying a constant value electrical potential to said third cell, said second means being deactivated from supplying electrical current to said third cell upon completion of the deplating of said second cell.

Claim 18

Apparatus as defined in claim 13 wherein: a fourth electrolytic plating cell capable of plating at a predeterminable rate, a constant value of electric current being supplied through said fourth cell, said fourth cell being activated immediately upon activation of the entire monitoring apparatus, said fourth cell only being deactivatable by deactivation of the entire monitoring apparatus.