US3682641A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist developer extender baths containing polyoxyalkylene ethers and esters and process of use
Assignee: EIDP Inc
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Filing: 1970-03-23
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Granted: 1972-08-08
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Expires: 1990-03-23
Abstract
Abstract ORGANIC POLYMER PHOTORESIST-BEARING ELEMENTS ARE DEVELOPED WITH A WATER-INSOLUBLE ORGANIC SOLVENT DEVELOPER TO FORM A RESIST WHICH IS TREATED IN A DEVELOPER EXTENDER BATH OF A MIXTURE OF (1) A MONOCARBOXYLIC ACID, MONO- OR DIESTER OF A POLYETHYLENE GLYCOL CONTAINING 2 TO 25 OCH2CH2- GROUPS, WHEREIN THE ACYL RADICAL OF SAID ESTER CONTAINS 2-18 CARBON ATOMS, AND (2) A 2-ALKOXYETHANOL, WHEREIN ALKOXY CONTAINS 2-4 CARON ATOMS. THE NOVEL EXTENDER BATHS MAY CONTAIN A NON-IONIC POLYOXYETHENE SURFACTANT. THE BATH EXTENDS THE LIFE OF THE DEVELOPER SOLUTION AND PREVENTS FORMATION OF SCUM ON THE RESIST.
Inventors
- 👤 Nancy Lee Cecile Casler
- 👤 Barbara Egee Vincentsen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 17:35
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-08-08 | 1976-02-07 | 1976-08-08 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-08-08 | 1980-02-07 | 1980-08-08 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-08-08 | 1984-02-07 | 1984-08-08 | $7700.00 | Window Closed / Lapsed |