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US3679501A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of polishing gallium phosphide

Assignee: International Business Machines Corp
•
Filing: 1970-04-13
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Granted: 1972-07-25
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Expires: 1990-04-13
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Abstract

Abstract A METHOD OF POLISHING GALLIUM PHOSPHIDE USED IN THE MANUFACTURE OF SEMICONDUCTIVE DEVICES. A GALLIUM PHOSPHIDE WAFER IS IMMERSED IN A SOLUTION CONSISTING OF FROM ABOUT 15 TO 20 PARTS BY VOLUME OF CONCENTRATED HYDROFLUORIC ACID AND FROM ABOUT 3 TO ABOUT 0.5 PARTS OF CONCENTRATED NITRIC ACID. TREATMENT BY THE HF-HNO3 SOLUTION OF THIS INVENTION LEAVES THE WAFER SUBSTANTIALLY PIT FREE WITH A MIRROR-LIKE SURFACE.

Inventors

  • 👤 Richard J Chicotka

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 15:13
CPC Classifications
H; H10; H10P; H10P90/00; H10P90/12; H10P90/126; H10P50/00; H10P50/60; H10P50/64; H10P50/642; H10P50/646

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-07-25 1976-01-24 1976-07-25 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-07-25 1980-01-24 1980-07-25 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-07-25 1984-01-24 1984-07-25 $7700.00 Window Closed / Lapsed

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