High capacity deposition reactor

Claim 1

A deposition reactor for depositing a film of a material from a gaseous-phase onto a substrate comprising: a. a housing having a top wall and a bottom wall disposed between a pair of opposite side walls, said bottom wall comprising a plurality of heater blocks having heating elements therein, a plate supporting said heater blocks, and a plurality of heater plates, each smaller than a heater block, disposed on said heater blocks, said top and bottom walls defining a gas passageway therebetween; b. said plurality of heater plates defining a substantially continuous flat heated surface of the bottom wall of said passageway upon which substrates may be placed; said top wall comprising a removable lid providing access to said heated surface; c. means including said plurality of heater plates changing the cross-sectional dimensions of a portion of said passageway for passing a flow of gas with a controlled turbulence in a laminar mode over said substrates; and d. means including tubing fixed in a heat exchange relationship with said side walls and said removable lid for cooling said housing and passageway so that only the heater plates and the substrates can be heated to an elevated temperature.