Novel nickel etch process
Abstract
Abstract A METHOD IS PROVIDED FOR IMPARTING DECORATIVE, LIGHT DIFFUSION AND/OR NON-REFLECTIVE ETCHING TO NICKEL SURFACES WHICH INCLUDES IMMERSING OBJECTS HAVING CLEAN NICKEL SURFACES IN A SOLUTION HAVING A PH WITHIN THE RANGE OF 9-12 AND CONTAINING A NICKEL OXIDANT, ETHYLENEDIAMINE AND A SOURCE OF SULFATE ION, FOR A PERIOD OF TIME SUFFICIENT TO FORM CRYSTALS ON THE NICKEL SURFACES, WITHDRAWING THE OBJECTS WITH THE CRYSTAL FORMATION THEREON FROM THE SOLUTION, REMOVING ANY REMAINING SOLUTION FROM THE NICKEL SURFACES, AND IMMERSING THE OBJECTS IN A CRYSTAL SOLVENT TO DISSOLVE THE CRYSTALS, AND REMOVING THE OBJECTS WITH THE ETCHED NICKEL SURFACES, THEREON, THE PATTERN OF THE ETCHING BEING SUBSTANTIALLY THE SAME AS THE ORIGINAL CRYSTALS FORMATION THEREON. FURTHER, SOLUTIONS ARE PROVIDED FOR IMPARTING THE DECORATIVE, LIGHT DIFFUSION AND/OR NON-REFLECTIVE ETCH AND OBJECTS HAVING DIPOSED THEREON DECORATIVE, LIGHT DIFFUSING AND/OR NON-REFLECTIVE ETCHED NICKEL SURFACES.
Inventors
- 👤 Frederick Walter Eppensteiner
Bibliographic Details
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