Cyclic polyisoprene photoresist compositions
Abstract
Abstract A CYCLIZED POLYISOPRENE/ARYL BIS-AZIDE SENSITIZED NEGATIVE PHOTORESIST FOR SEMICONDUCTOR DEVICE MANUFACTURE CONTAINING A MAXIMUM OF 1.3% SENSITIZER, AND CHARACTERIZED BY THE THREE PARAMETERS (A) THE PERCENTAGE OF UNCYCLIZED ISOPRENE (FOR MONOMER) UNITS AS A FUNCTION OF SENSITIZER CONTENT, REPRESENTED BY THE SYMBOL R, WHERE R=PERCENT UNCYCLIZED POLYISOPRENE/PERCENT SENSITIZER. (B) THE RATIO OF INTERNAL TO TERMINAL DOUBLE BONDS IN A CYCLIZED MATERIAL AS A FUNCTION OF SENSITIZER REPRESENTED BY THE SYMBOL Q, WHERE Q=IR ABSORBANCE OF INTERNAL C=C/IR ABSORBANCE TERMINAL C=C-PERCENT SENSISITIZER, AND (C) A COMBINED SENSITIZER DEPENDENT FIGURE OF MERIT FUNCTION K WHERE K=QRS WITH THE FOLLOWING MAXIMUM LIMITS SET TO THE PARAMETERS: QMAX=0.47, RMAX=13.0, AND KMAX=7.94
Inventors
- 👤 Donald L Klein
- 👤 Michael W Macintyre
- 👤 Lawrence J Rothman
Bibliographic Details
Claims Analysis
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