Process for making integrated circuit masks
Abstract
Abstract Process for making a mask for integrated circuits in which a drawing is prepared of each standard pattern required in the circuit. A plurality of positive copies are prepared of each drawing with the number of positive copies being equal to the number of times the standard pattern is repeated in the integrated circuit. The positive copies are arranged on a sheet of substantially transparent dimensionally stable material and then secured in the desired positions. The non-standard parts are then drawn onto the sheet for interconnecting the standard patterns to provide a composite pattern for the integrated circuit. The composite pattern is then utilized for producing a negative of the pattern for the integrated circuit. The assembly consists of the substantially transparent, dimensionally stable sheet which has fastened thereto positive copies of the standard patterns with interconnecting circuitry drawn on the sheet.
Inventors
- 👤 Hans R Camenzind
Bibliographic Details
Claims Analysis
Total Claims: 0References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-05-16 | 1975-11-15 | 1976-05-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-05-16 | 1979-11-15 | 1980-05-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-05-16 | 1983-11-15 | 1984-05-16 | $7700.00 | Window Closed / Lapsed |