Cathode sputtering apparatus for the deposition of composite thin films
Abstract
Abstract Cathode sputtering apparatus permitting: Simultaneously or sequentially depositing an alternate or non-alternate layer of homogeneous or heterogeneous composition on a large number or substrates without breaking the vacuum, in the course of a single cathode sputtering operation; Adjusting the distance and the orientation of centrally located targets; Disposing the substrates on an object holder rotating continuously about the targets; Carrying out the thickness monitoring measurements of the deposits outside the zones of circulation of the beams of charged particles, in the course of the deposition; Eliminating any rotating joint in the construction of the apparatus; Automating the manufacture.
Inventors
- 👤 Roland Borgne
- 👤 Jean Joly
- 👤 Edouard Rosiaux
Bibliographic Details
Claims Analysis
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-05-09 | 1975-11-08 | 1976-05-09 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-05-09 | 1979-11-08 | 1980-05-09 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-05-09 | 1983-11-08 | 1984-05-09 | $7700.00 | Window Closed / Lapsed |