Stabilized, chemical nickel plating bath

Claim 2

A nickel-plating bath according to claim 1 wherein said stabilizer is selected from the group consisting of: potassium-diselenide; dipropyl diselenide; di-n-butyl diselenide; di-n-amyl diselenide; di-n-hexyl diselenide; di-n-heptyl diselenide; di-(2-3-dihydroxypropyl)diselenide; di-(potassiumsulfopropyl)diselenide; di-(potassiumsulfoethyl)diselenide; di-(sodiumsulfobutyl)diselenide; bis-(sodiumcarboxymethyl)diselenide; bis-(potassiumcarboxylethyl)diselenide; bis-(potassiumcarboxypropyl)diselenide; bis-(potassiumcarboxydecyl)diselenide; diphenyl diselenide; di-p-tolyl diselenide; di-(p-methoxyphenyl)diselenide; di-(p-nitrophenyl)diselenide; bis-(o-acetylphenyl)diselenide; di-2,2''-biphenylyl diselenide; bis-(p-potassiumsulfophenyl)diselenide; bis-(p-chlorophenyl)diselenide; bis-(p-carboxyphenyl)diselenide; diseleniumdiacetylurea; dibenzyl diselenide; di-(N-phenyl-carbamoylmethyl)-diselenide; bis-(p-nitrobenzyl)diselenide; bis-(p-methylbenzyl)diselenide; bis-(p-cyanobenzyl)diselenide; bis-(p-carboxybenzyl)diselenide; bis-(B-bromobenzyl)diselenide; bis-( Beta -phenylethyl)diselenide; bis-(3-hydroxypropyl)diselenide; bis-( Alpha -tetrahydrofurylmethyl)diselenide; bis-( Beta -phenoxyethyl)diselenide; bis-(cyclohexyl)diselenide; bis-(cyclopentyl)diselenide; potassiumselenosulfate; potassiumbenzylselenosulfate; potassium p-nitrobenzylselenosulfate potassium p-methylbenzylselenosulfate; potassium p-potassium-carboxybenzylselenosulfate; potassium p-methoxybenzylselenosulfate; potassium p-ethoxybenzylselenosulfate; potassium p-cyanobenzylselenosulfate; potassium p-ethyl-benzylselenosulfate; potassium p-bromobenzylselenosulfate; potassium ethylselenosulfate; potassium butylselenosulfate; potassium octylselenosulfate; potassium dodecylselenosulfate; potassium 1,3-dihydroxypropylselenosulfate; potassium hydroxyethylselenosulfate; potassium phenoxyethylselenosulfate; potassium tetrahydrofurfurylselenosulfate; potassium phenylethylselenosulfate; potassium phenylpropylselenosulfate; potassium 3-hydroxypropylselenosulfate; dipotassium w-carboxyethylselenosulfate; dipotassium w-carboxybutylselenosulfate; dipotassium w-carboxydecylselenosulfate; dipotassium w-sulfoethylselenosulfate; dipotassium w-sulfopropylselenosulfate; potassium cyclopentylselenosulfate; potassium selenide; phenylseleniumacetic acid; o-, m- or p-nitrophenylseleniumacetic acid; o-, m- or p-methoxyphenylseleniumacetic acid; o-, m- or p-chlorophenylseleniumacetic acid; 3,4 -dimethylphenylseleniumacetic acid; 2,4-dimethylphenylseleniumacetic acid; benzylseleniumacetic acid; ethylseleniumacetic acid; seleniumdiacetic acid; seleniumdiproponic acid; seleniumdibutyric acid; benzylseleniumbutyric acid; benzylseleniumundecanoic acid; sodium ethylseleniumpropanesulfonate; bis-(sodium sulfopropyl)selenide; phenylseleniumglycolic acid; sodium phenylseleniumpropanesulfonate; sodium benzylseleniumpropane sulfonate; bis-(phenoxyethyl)selenide; diphenylselenide; dibenzylselenide; difurfurylselenide; bis-p-methylphenylselenide; bis-p-nitrophenylselenide; bis-3-phenylpropylselenide; dipropylselenide; bis-(hydroxyethyl)selenide; sodiumselenocyanate; potassiumselenocYanate; o-, p- or m-nitrophenylselenocyanate; o-, m- or p-methylphenylselenocyanate; p-methoxyphenylselenocyanate; p-ethylphenylselenocyanate; p-ethoxyphenylselenocyanate; sodium 4-cyanoseleno-phenylsulfonate; o-, m- or p-chlorophenylselenocyanate; 2-nitro-4-chlorophenylselenocyanate; p-carbmethoxyphenylselenocyanate; ethylselenocyanate; butylselenocyanate; decylselenocyanate; potassium selenocyanoacetate; potassium selenocyanopropionate; potassium selenocyanoundecanoate; potassium selenocyanopropanesulfonate; potassium selenocyanoethanesulfonate; phenoxyethylselenocyanate; furfurylselenocyanate; benzylselenocyanate; phenylpropylselenocyanate; p-nitrophenylselenocyanate; Beta -naphthylselenocyanate; phenylselenocyanate; carboxymethyldimethyl-selenoniumbromide; phenacyl-dimethyl-selenoniumbromide; dimethyl-selenetin dicarboxylic acid; triethylselenonium iodide; tribenzylselenoniumchloride; dimethyl-benzyl-selenoniumbromide; triphenylselenoniumchloride; tri-p-tolylselenoniumchloride. 4 In the method of depositing nickel on a conductive surface or an activated nonconductive surface by immersing said surface in a bath containing a source of nickel ions, a complexing agent and a reducing agent capable of reducing said ions on a surface, the improvement which comprises immersing said surface in a bath according to claim 1.

Claim 3

In the method of depositing nickel on a conductive surface or an activated nonconductive surface by immersing said surface in a bath containing a source of nickel ions, a complexing agent and a reducing agent capable of reducing said ions on a surface, the improvement which comprises immersing said surface in a bath according to claim 2.