US3644191A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sputtering apparatus
Assignee: Toshiba Corp
•
Filing: 1969-03-13
•
Granted: 1972-02-22
•
Expires: 1989-03-13
Abstract
Abstract In a sputtering apparatus a plasma is formed between a cylindrical first electrode and a second electrode concentric with the first electrode. Either one of the electrodes is made of a material to be sputtered and the surface of the other electrode is covered by a thin film of the sputtered material.
Inventors
- 👤 Katsuo Matsushima
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 18:44
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35; H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
190 words
A sputtering apparatus comprising: an evacuable chamber; means for introducing an ionizable gas into said chamber; a cylindrical target electrode disposed in said evacuable chamber; a rodlike metallic electrode electrically connected to ground and disposed coaxially within said cylindrical target and spaced from said cylindrical target; means disposed on the base of said evacuable chamber for supporting said rodlike electrode and for supporting a cylindrical member to be coated with sputtered material, said member to be coated being supportable coaxially around and adjacent to said rodlike electrode; an anode electrode and a cathode electrode disposed within said evacuable chamber spaced from respective ends of said cylindrical target electrode; power supply means for impressing a predetermined voltage across said anode electrode and said cathode electrode, a negative potential to said target electrode and a positive potential to said rodlike electrode to establish a plasma which passes through the space between said target and rodlike electrodes; means disposed adjacent to said evacuable chamber to focus said plasma within the space between said target and rodlike electrodes, and whereby material is sputtered from the target onto the outer surface of the cylindrical member.
Claim 2
Dependent Claim
190 words
A sputtering apparatus comprising: an evacuable chamber; means for introducing an ionizable gas into said chamber; a cylindrical target electrode disposed in said evacuable chamber; a rodlike metallic electrode electrically connected to ground and disposed coaxially within said cylindrical target and spaced from said cylindrical target; means disposed on the base of said evacuable chamber for supporting said rodlike electrode and for supporting a cylindrical member to be coated with sputtered material, said member to be coated being supportable coaxially around and adjacent to said rodlike electrode; an anode electrode and a cathode electrode disposed within said evacuable chamber spaced from respective ends of said cylindrical target electrode; power supply means for impressing a predetermined voltage across said anode electrode and said cathode electrode, a negative potential to said target electrode and a positive potential to said rodlike electrode to establish a plasma which passes through the space between said target and rodlike electrodes; means disposed adjacent to said evacuable chamber to focus said plasma within the space between said target and rodlike electrodes, and whereby material is sputtered from the target onto the outer surface of the cylindrical member.
Claim 3
Dependent Claim
15 words
The plasma sputtering apparatus according to claim 1 wherein said ionizable gas is argon gas.
Claim 4
Dependent Claim
20 words
The plasma sputtering apparatus according to claim 1 wherein said means to focus said plasma is a cylindrical focusing magnet.
Claim 5
Dependent Claim
24 words
The plasma sputtering apparatus according to claim 1 wherein said anode is an anode disc electrode and said cathode is a cathode filament electrode.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1975-02-21 | 1975-08-23 | 1976-02-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1979-02-21 | 1979-08-23 | 1980-02-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1983-02-21 | 1983-08-23 | 1984-02-22 | $7700.00 | Window Closed / Lapsed |