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US3639249A Expired / Lapsed US ⏱️ 0.0 years remaining

Bis-oxalic acid ester amides for use as ultraviolet stabilizers

Assignee: BASF Schweiz AG
•
Filing: 1968-05-13
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Granted: 1972-02-01
•
Expires: 1988-05-13
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Abstract

Abstract The present invention provides a process for protecting organic materials that can be damaged by ultraviolet light from the effects of ultraviolet rays, characterized in that a bis-oxalic acid amide ester is incorporated with, or applied to the surface of the materials to be protected, or a filter layer containing the bis-oxalic acid amide esters is placed in front of said materials, the said bis-oxalic acid amide ester corresponding to the formula A1-O-CO-CO-NH-W1-NH-CO-CO-O-B1 in which A1 and B1 are identical or different and each represents an organic residue and should not displace the absorption maximum of these compounds to values above 370 Mu ; W1 represents an organic residue and should not displace the absorption maximum of these compounds to values above 370 Mu ; W1 represents an organic residue, and X1 represents an alkylene group containing one to four carbon atoms or a bridge member -O-, -S-, -N- or -SO2-. Furthermore the invention discloses a certain class of novel symmetric bis-oxalic acid amide esters as defined by formula (6) of the specification and a process for the manufacture of the symmetric bis-oxalic acid amide esters defined above.

Inventors

  • 👤 Christian Luethi
  • 👤 Hans Rudolf Biland
  • 👤 Max Duennenberger

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 21:23
CPC Classifications
C; C11; C11B; C11B5/00; C11B5/0042; C11B5/0057; A; A61; A61K; A61K8/00; A61K8/18; A61K8/30; A61K8/40; A61K8/42; A61Q; A61Q17/00; A61Q17/04; C09; C09K; C09K15/00; C09K15/04; C09K15/20; C09K15/22; D; D06; D06M; D06M13/00; D06M13/322; D06M13/402; D06M13/418; G; G03; G03C; G03C1/00; G03C1/76; G03C1/815; G03C1/8155

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 147 words
A process according to claim 1, wherein a symmetric bis-oxalic acid amide ester of the formula A3-O-CO-CO-NH-W2-NH-CO-CO-O-A3 is used in which A3 represents an alkyl group containing one to 18 carbon atoms, a phenylakyl group whose alkyl residue contains one to four carbon atoms, an alkoxyalkyl group with one to 12 carbon atoms and preferably one to three -O- bridges, an alkenyl group containing one to four carbon atoms or a cyclohexyl group, and W2 represents a 1,3- or 1,4-phenylene, a 4,4''-diphenylene or a 1,4- or 1,5-naphthylene group or a group in which X2 represents a bridge member -SO2- or a linear or branched alkylene group containing one to four carbon atoms and phenylene nuclei of the aforesaid groupings may contain one or two substituents Z2, Z2 being halogen or an alkyl or alkoxy group containing one to four carbon atoms, and m 0, 1 or 2.
Claim 2
Dependent Claim 118 words
A process according to claim 1, wherein a symmetric bis-oxalic acid amide ester of the formula A3-O-CO-CO-NH-W3-NH-CO-CO-O-A3 is used, in which A3 represents an alkyl group containing one to 18 carbon atoms, a phenylalkyl group whose alkyl residue contains one to four carbon atoms, an alkoxyalkyl group containing one to 12 carbon atoms and preferably one to three -O- bridges, an alkenyl group containing one to four carbon atoms or a cyclohexyl group, and W3 represents a 1,3- or 1,4-phenylene, a 4,4''-di-phenylene or 1,4- or 1,5-naphthalene group, and phenylene nuclei in the aforesaid groupings may contain one or two substituents Z2, Z2 being a halogen atom or an alkyl or alkoxy group containing one to four carbon atoms.
Claim 3
Dependent Claim 106 words
A process according to claim 1, wherein a symmetric bis-oxalic acid amide ester is used which corresponds to the formula A4-O-CO-CO-NH-W2-NH-CO-CO-O-A4 in which A4 represents an alkyl group containing one to six carbon atoms and W2 a 1,3- or 1,4-phenylene, a 4,4''-diphenylene or 1,4- or 1,5-naphthylene group or a group in which X2 represents a bridge member -SO2- or a linear or branched alkylene group containing one to four carbon atoms and phenylene nuclei of the aforesaid groupings may contain one or two substituents Z2, Z2 being halogen or an alkyl or alkoxy group containing one to four carbon atoms, and m 0, 1 or 2.
Claim 4
Dependent Claim 138 words
A process according to claim 1, wherein a symmetric bis-oxalic acid amide ester of the formula A5-O-CO-CO-NH-W2-NH-CO-CO-O-A5 is used in which A5 represents an alkyl group containing seven to 18 carbon atoms, a phenylalkyl group whose alkyl residue contains one to four carbon atoms, an alkoxyalkyl group containing one to eight carbon atoms and one to three oxygen bridges, an allyl or cyclohexyl group, and W2 represents a 1,3-or 1,4-phenylene group, a 4,4''-diphenylene group, a 1,4- or 1,5-naphthylene group or a group in which X2 represents a bridge member -SO2- or a linear or branched alkylene group containing one to four carbon atoms and phenylene nuclei of the aforesaid groupings may contain one or two substituents Z2, Z2 being halogen or an alkyl or alkoxy group containing one to four carbon atoms, and m 0, 1 or 2.
Claim 5
Dependent Claim 32 words
Organic polymeric materials containing 0.01 to 10 percent, by weight, referred to the organic material of at least one bis-oxalic acid amide ester as defined in claim 1 as an ultraviolet absorber.

References Cited (Backward Citations)

GB517421A Cited
US2268754A Cited
US2956896A Cited
US3138572A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1975-01-31 1975-08-02 1976-02-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1979-01-31 1979-08-02 1980-02-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1983-01-31 1983-08-02 1984-02-01 $7700.00 Window Closed / Lapsed

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