US3616286A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Automatic process and apparatus for uniform electroplating within porous structures
Assignee: RTX Corp
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Filing: 1969-09-15
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Granted: 1971-10-26
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Expires: 1989-09-15
Abstract
Abstract An automatic process for uniformly electroplating the internal surfaces of conducting porous structures. The method is particularly suitable for the electrodeposition of a catalytic material within a fuel cell electrode. A potential pulse travels through the porous structure upon the initial application of a plating potential to the structure causing local depletion of the ions in solution within the pores of the structure. Exhaustion of ions is sensed causing cessation of the applied potential while scheduling a flow of fresh plating solution through the electrode. Replenishment of ions triggers a new plating cycle.
Inventors
- 👤 John A Aylward
- 👤 Lawrence J Bregoli
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 20:03
CPC Classifications
H; H01; H01M; H01M4/00; H01M4/86; H01M4/88; H01M4/8825; H01M4/8853; C; C25; C25D; C25D17/00; C25D17/002; C25D21/00; C25D21/16; C25D21/18; H01M4/8803; H01M4/8807; Y; Y02; Y02E; Y02E60/00; Y02E60/30; Y02E60/50
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
51 words
The method of claim 1 including: replenishing the plating solution by causing a flow of plating solution and catalyst ions through the porous electrode resulting in the elimination of the concentration gradient between the ion-depleted plating solution within the substrate and the concentration of the ions in the bulk plating solution.
Claim 2
Dependent Claim
66 words
The method of claim 2 including: comparing the potential at the back surface of the electrode with the plating potential set at the front surface of the electrode; and switching sequentially from plating to electrolyte replenishment responsive thereto and determining electrolyte replenishment when the plating solution in the pores of the electrolyte iS complete by sensing a predetermined potential at the back surface of the electrode.
Claim 3
Dependent Claim
24 words
The method of claim 2 including: determining electrolyte replenishment by comparing the potential at the back surface of the electrode with open circuit potential.
Claim 4
Independent Claim
157 words
The method of electroplating a metal uniformly throughout a porous structure by alternately plating and replenishing the plating solution within the pores of the structure which comprises the steps of: disposing an electrically conductive porous structure in a plating cell and dividing the plating cell into two compartments each containing the metal ions in the plating solution; applying a plating potential to the structure whereby metal ions in the plating solution are deposited on the structure causing a decrease in ion concentration within the structure and a potential pulse traveling through the structure; detecting the change in potential at the back surface of the structure and interrupting the plating potential applied responsive thereto; and causing an intermittent flow of plating solution through the structure whereby the metal ion depleted plating solution within the pores of the structure is replenished out of phase with the plating and responsive to the change in potential at the back surface structure.
Claim 5
Independent Claim
201 words
An apparatus for automatically electroplating a metal uniformly through the pores of a structure by alternately plating and replenishing the plating solution within the pores comprising; a plating cell having an anode, said cell adapted to contain a porous structure to be electroplated as a cathode and metal ions to be plated in the plating solution; means for applying a plating potential between the anode and the cathode causing a potential pulse to travel through the porous structure from the front side to the back side upon the initial application of the plating potential to the structure; means for sensing the potential at the back surface of the structure; means for interrupting the applied potential responsive to decreased potential sensed at the backside of the structure; and means for flowing the plating solution containing metal ions to be plated through the porous structure containing ion depleted electroplating solution responsive to decreased potential sensed at the backside of the porous structure whereby the replenishment of the solution increases the potential sensed at the backside of the structure causing a cessation of the flow of plating solution and commencing another cycle of the plating process by initiating the application of another plating potential.
Claim 6
Dependent Claim
43 words
An apparatus as in claim 6 including means for sensing the applied potential at the front surface of a cathode whereby said means transmits a signal to the means for applying the plating potential to maintain the applied potential at any preset value.
Claim 7
Dependent Claim
101 words
An apparatus as in claim 7 wherein the means for flowing the plating solution through the porous structure comprises a continuously operating pump and a duct to the plating cell having normally open solenoid valve and a bypass line returning electroplating solution to the pump also having a normally open solenoid valve wherein the means for sensing the potential at the back surface of the structure transmits a signal to a switching relay, transferring power from one solenoid to another to direct the flow of plating solution either through the porous structure or around the bypass when plating is in progress.
Claim 8
Dependent Claim
45 words
An apparatus as in claim 8 wherein the means for sensing potential at the back surface of the cathode is a reference electrode which transmits a signal to a switching relay, the switching relay activating means for transferring the plating potential to a dummy load.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-10-25 | 1975-04-26 | 1975-10-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-10-25 | 1979-04-26 | 1979-10-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-10-25 | 1983-04-26 | 1983-10-26 | $7700.00 | Window Closed / Lapsed |