Photolysable compounds and their uses in photographic processes
Abstract
Abstract Radiation-sensitive compositions and recording materials containing compositions which are light- and heat-sensitive and which include a photolysable compound having the formula: WHEREIN EACH OF X, Y, and Z is an acyl radical, cyano, nitro, azido, a carbamyl group, a sulphamyl group, or wherein X and Y are joined to form a nucleus containing two strong electronwithdrawing groups, either of them attached to the carbon atom having the Z substituent, and R is hydrogen, azido, an alkyl radical, an aryl radical, or a heterocyclic radical, AND A SUBSTANCE WHICH, UNDER THE INFLUENCE OF RADICALS FORMED DURING EXPOSURE TO LIGHT AND HEAT, UNDERGOES A CHEMICAL CHANGE ARE DESCRIBED. These compositions are useful in the production of a visible or developable latent image.
Inventors
- 👤 Albert Lucien Poot
- 👤 Robert Joseph Pollet
- 👤 Gerard Albert Delzenne
Bibliographic Details
Claims Analysis
Total Claims: 9References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-10-25 | 1975-04-26 | 1975-10-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-10-25 | 1979-04-26 | 1979-10-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-10-25 | 1983-04-26 | 1983-10-26 | $7700.00 | Window Closed / Lapsed |