Getter pump with direct resistance heating of getter strip

Claim 2

A getter pump comprising a substrate of high ohmic resistance; a particulate nonevaporable getter material embedded in the substrate; and means for causing an electrical current to flow through the substrate wherein the substrate is of a material having a resistivity of 1 to 200 microhm-centimeters when measured at 20* C.

Claim 3

The pump of claim 1 wherein the nonevaporable getter material is an alloy of 5 to 30 weigh percent aluminum, balance zirconium.

Claim 4

The pump of claim 2 wherein the nonevaporable getter material is an alloy of 16 weight percent aluminum, balance zirconium.

Claim 5

The pump of claim 1 wherein the means for causing an electrical current to flow comprises electrodes attached to opposite ends of the substrate.

Claim 6

The pump of claim 1 wherein the substrate is pleated.

Claim 7

The pump of claim 5 wherein the pleated substrate is circularly formed.

Claim 8

A getter pump of claim 1 comprising: A. a gastight envelope having a rim defining an opening attachable to a vessel in fluid communication therewith; B. a first retainer fixedly attached to the envelope, the first retainer having an annular groove; C. a second retainer fixedly attached to the envelope, the second retainer having an annular groove facing the annular groove of the first retainer; D. at least one strip of planar substrate of a material of high ohmic resistance having embedded in the substrate a particulate nonevaporable getter material, the pleated strip being between the retainers resting in the annular grooves of adjacent retainers; and, E. means for causing an electrical current to flow through the substrate, whereby imposing a potential across the electrodes causes current to flow through the pleated strip heating and activAting the embedded getter material thereby increasing the rate of sorption of gas within the vessel.

Claim 9

A getter pump comprising a substrate of high ohmic resistance; a particulate nonevaporable getter material embedded in the substrate; and means for causing an electrical current to flow through the substrate wherein the substrate is of a material having a resistivity of 10 to 150 microhm-centimeters when measured at 20* C.

Claim 10

A getter pump comprising a substrate of high ohmic resistance; a particulate nonevaporable getter material embedded in the substrate; and means for causing an electrical current to flow through the substrate wherein the substrate is of a material having a resistivity of 10 to 150 microhm-centimeters when measured at 20* C.

Claim 11

A process for increasing the sorptive rate of particulate nonevaporable getter material embedded in a substrate comprising the step of passing an electrical current through the substrate thereby ohmically generating heat in the substrate and conducting the heat to the particulate nonevaporable getter material wherein the electrical current is passed at a rate such that the particulate nonevaporable getter material is heated to 600* to 900* C. to activate the getter material.

Claim 12

A process for increasing the sorptive rate of particulate nonevaporable getter material embedded in a substrate comprising the step of passing an electrical current through the substrate thereby ohmically generating heat in the substrate and conducting the heat to the particulate nonevaporable getter material wherein the electrical current is passed at a rate such that the particulate nonevaporable getter material is heated to 600* to 900* C. to activate the getter material.

Claim 13

A process for increasing the sorptive rate of a particulate nonevaporable getter material embedded in a substrate comprising the step of passing an electrical current through the substrate thereby ohmically generating heat in the substrate and conducting the heat to the particulate nonevaporable getter material wherein the electrical current is passed at a rate such that the particulate nonevaporable getter material is maintained at a temperature of 250* to 400* C. in order to sorb active gases at a maximum rate while avoiding evolution of hydrogen.

Claim 14

A process for increasing the sorptive rate of a particulate nonevaporable getter material embedded in a substrate comprising the step of passing an electrical current through the substrate thereby ohmically generating heat in the substrate and conducting the heat to the particulate nonevaporable getter material wherein the electrical current is passed at a rate such that the particulate nonevaporable getter material is maintained at a temperature of 250* to 400* C. in order to sorb active gases at a maximum rate while avoiding evolution of hydrogen.

Claim 15

A getter pump comprising a substrate of high ohmic resistance; a particulate nonevaporable getter metal embedded in the substrate and means for imposing a potential across the substrate in order to cause an electrical current to flow through the substrate heating it and conducting the heat to the particulate nonevaporable getter metal embedded therein.

Claim 16

A getter pump comprising a substrate of high ohmic resistance; a particulate nonevaporable getter metal embedded in the substrate and means for imposing a potential across the substrate in order to cause an electrical current to flow through the substrate heating it and conducting the heat to the particulate nonevaporable getter metal embedded therein.