US3607382A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of producing photovarnish masks for semiconductors
Assignee: Individual
•
Filing: 1968-10-18
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Granted: 1971-09-21
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Expires: 1988-10-18
Abstract
Abstract Described is a method of producing photovarnish masks for semiconductors. A photovarnish layer, positioned on a workpiece, is selectively illuminated, whereupon portions of the photovarnish layer are removed through developing. The illumination is effected by means of a thin electron beam, moved essentially along a single coordinate direction. The photovarnish layer to be illuminated is moved perpendicularly to the movement direction of the electron beam. The respective movement length of the electron beam is limited according to the pattern of the photovarnish mask to be produced.
Inventors
- 👤 Heinz Henker
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 21:41
CPC Classifications
H; H10; H10P; H10P95/00; B; B82; B82Y; B82Y10/00; B82Y40/00; H01; H01J; H01J37/00; H01J37/30; H01J37/317; H01J37/3174; Y; Y10; Y10S; Y10S430/00; Y10S430/143
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
23 words
The method of claim 1, wherein the movement length of the electron beam is limited by the edge of a slot shaped pattern.
Claim 2
Dependent Claim
31 words
The method of claim 2, wherein the electron beam is moved along a slot and the photovarnish layer to be illuminated is guided perpendicularly to the longitudinal direction of the slot.
Claim 3
Dependent Claim
41 words
The method of claim 1, wherein the electron beam being used is focused upon a maximum diameter of 0.2 Mu ., and is essentially moved to and fro by about + or - 1 to 1 mm., in one coordinate direction.
Claim 4
Dependent Claim
25 words
The method of claim 1, wherein the irradiation of the photovarnish layer is effected in the same vessel as the production of the electron beam.
Claim 5
Dependent Claim
57 words
The method of claim 1, wherein the gas pressure in the vicinity of the photovarnish layer to be irradiated is adjusted higher than in the generating device of the electron beam, whereby the electron beams are guided from a high evacuation vessel via a Lenard window into an area of higher pressure which contains the photovarnish layer.
Claim 6
Dependent Claim
32 words
The method of claim 6, wherein the electron beam is given, in addition to its main movement direction, a small movement component, travelling back and forth perpendicularly to the main movement direction.
Claim 7
Dependent Claim
21 words
The method of claim 1, wherein the displacement of the photovarnish layer below the electron beam is controlled by laser interferences.
Claim 8
Dependent Claim
45 words
The method of claim 8, wherein the movement of the photovarnish layer, perpendicular to the deflection device of the writing electron beam, is measured by laser interferences and the writing movement of the electron beam is repeated according to a given number of interference passageS.
Claim 9
Dependent Claim
39 words
The method of claim 1, wherein the electron beam is guided in only one direction across the photovarnish layer to be irradiated, while a movement in the opposite direction is effected in a ''''darkened state'''' of the electron beam.
Claim 10
Dependent Claim
51 words
The method of claim 10, wherein irradiating traces of the writing electron beam, which runs parallel to each other, are arranged so densely with respect to each other that the area filled with writing by the electron beam behaves uniformly during subsequent developing processes whereby the writing traces overlap one another.
Claim 11
Dependent Claim
36 words
The method of claim 11, wherein the electron beam is scanned along its writing path, so that the simultaneous writing upon the carrier produces the mask image perpendicularly to the writing direction of the electron beam.
Claim 12
Dependent Claim
47 words
The method of claim 12, wherein following the creation of a row of discreet illuminating places, arranged in displacement direction of the photovarnish layer, the carrier is returned to its original position so that, in parallel to said row, a second row may be filled with writing.
Claim 13
Dependent Claim
20 words
The method of claim 1, wherein the photovarnish layer to be illuminated is made more sensitive to electron beam illumination.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-09-20 | 1975-03-22 | 1975-09-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-09-20 | 1979-03-22 | 1979-09-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-09-20 | 1983-03-22 | 1983-09-21 | $7700.00 | Window Closed / Lapsed |