US3594170A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Additives to negative photoresists which increase the sensitivity thereof
Assignee: AT&T Inc
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Filing: 1968-10-03
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Granted: 1971-07-20
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Expires: 1988-10-03
Abstract
Abstract THE USE OF A SCANNING ELECTRON BEAM TO GENERATE A PATTERN IN A NEGATIVE PHOTORESIST IS KNOWN. ELECTRON BEAM EQUIPMENT CAN BE MADE WHICH IS CAPABLE OF SCANNING VERY QUICKLY, BUT STANDARD NEGATIVE PHOTORESISTS REQUIRE SUCH A LARGE FLUX OF ELECTRONS FOR PROPER EXPOSURE THAT THE SCANNING EQUIPMENT MUST BE OPERATED AT SPEEDS SUBSTANTIALLY SLOWER THAN THE CAPABILITY OF THE EQUIPMENT. BY ADDING SOLUBLE, HEAVY ORGANOMETALLIC COMPOUNDS FROM GROUPS III-V OF THE PERIODIC TABLE TO THE PHOTORESIST, THE SENSITIVITY OR SPEED OF THE PHOTORESIST IS EFFECTIVELY INCREASED. AS A RESULT, THE ELECTRON BEAM CAN SCAN AT A HIGHER RATE.
Inventors
- 👤 Barret Broyde
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 22:21
CPC Classifications
C; C23; C23F; C23F1/00; C23F1/02; G; G03; G03F; G03F7/00; G03F7/004; G03F7/027; G03F7/028; G03F7/029; G03F7/038; G03F7/0388
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-07-19 | 1975-01-18 | 1975-07-20 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-07-19 | 1979-01-18 | 1979-07-20 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-07-19 | 1983-01-18 | 1983-07-20 | $7700.00 | Window Closed / Lapsed |