US3592691A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresist removal method
Assignee: Westinghouse Electric Corp
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Filing: 1968-07-11
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Granted: 1971-07-13
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Expires: 1988-07-11
Abstract
Abstract THE METHOD OF REMOVING A PHOTORESIST LAYER AFTER PHOTO PROCESSING FROM A SEMICONDUCTOR SUBSTRATE INCLUDING THE STEPS OF IMMERSING A SUBSTRATE CONTAINING RESIDUALS OF PHOTORESIST MASKS INTO A PHOTORESIST SOLVENT AND HEATING THE SOLVENT TO A TEMPERATURE RANGING FROM ABOUT 150* TO 250*C. WHILE SUBJECTING THE SOLVENT TO A PRESSURE OF ABOUT 300 P.S.I.G. FOR A TIME PERIOD OF FROM ABOUT ONE-QUARTER UP TO THREE HOURS.
Inventors
- 👤 Manfred K Stelter
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 05:36
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/42; G03F7/422; G03F7/426; H; H10; H10P; H10P50/00; H10P50/20; H10P50/28; H10P50/286; H10P50/287
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-07-12 | 1975-01-11 | 1975-07-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-07-12 | 1979-01-11 | 1979-07-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-07-12 | 1983-01-11 | 1983-07-13 | $7700.00 | Window Closed / Lapsed |