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US3589949A Expired / Lapsed US ⏱️ 0.0 years remaining

Semiconductors and methods of doping semiconductors

Assignee: United Kingdom Atomic Energy Authority
•
Filing: 1969-08-18
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Granted: 1971-06-29
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Expires: 1989-08-18
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Abstract

Abstract A REGION OF SEMICONDUCTOR MATERIAL IS DOPED BY BOMBARDING THE REGION WITH DOPANT IONS, ADDITIONALLY BOMBARDING THE REGION WITH NON-DOPANT IONS, AND ANNEALING THE REGION. THE ADDITIONAL BOMBARDMENT, ESPECIALLY IF SUFFICIENT TO FORM THE REGION INTO AN AMORPHOUS CONDITION, WHICH IS RECRYSTALLISED BY THE ANNEAL, IMPROVES THE ABSORPTION OF THE DOPANT IONS INTO ACTIVE SUBSTITUTIONAL SITES IN THE LATTICE.

Inventors

  • 👤 Richard Stuart Nelson

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 16:59
CPC Classifications
C; C30; C30B; C30B31/00; C30B31/20; C30B31/22; H; H10; H10P; H10P30/00; H10P30/20; H10P30/202; H10P30/204; H10P30/208; H10P30/21; H10P30/28

Claims Analysis

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References Cited (Backward Citations)

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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1974-06-28 1974-12-28 1975-06-29 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1978-06-28 1978-12-28 1979-06-29 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1982-06-28 1982-12-28 1983-06-29 $7700.00 Window Closed / Lapsed

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