Brush cleaning apparatus for semiconductor slices
Abstract
Abstract SEMICONDUCTOR SLICES ARE CLEANED IN AN APPARATUS WHICH PERFORMS THE OPERATIONS OF BRUSHING WITH A CLEANING AGENT, IMPACT RINSING, AND SPIN-DRYING. A PLURALITY OF SLICES ARE MOUNTED ON A ROTATING DISC NEAR ITS PERIPHERY SO THAT THEY PASS UNDER A ROTATING SCRUBBING BRUSH AND UNDER NOZZLES WHICH SUCCESSIVELY DISPENSE CLEANING SOLUTION AND RINSING WATER ONTO THE SLICES. THE BRUSH IS MOVABLY MOUNTED SO THAT IT MAY RETRACT ALONG ITS AXIS OF ROTATION TO A POSITION AWAY FROM THE SLICES DURING RINSING AND DRYING. DRYING IS ACCOMPLISHED BY SUBSTANTIALLY INCREASING THE SPEED OF THE ROTATING DISC SO AS TO FLING RESIDUAL MATTER THEREFROM. THE RESULTING SLICES ARE SUBSTANTIALLY FREE OF DIRT PARTICLES, STAINS AND FINGERPRINTS, MAKING THEM SUITABLE FOR USE IN VARIOUS SEMICONDUCTOR DEVICES.
Inventors
- 👤 Ralph J Jaccodine
- 👤 Donald R Oswald
Bibliographic Details
Claims Analysis
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| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
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| 3.5 Years (Year 4) | 1974-06-21 | 1974-12-21 | 1975-06-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-06-21 | 1978-12-21 | 1979-06-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-06-21 | 1982-12-21 | 1983-06-22 | $7700.00 | Window Closed / Lapsed |