US3584948A
Expired / Lapsed
US
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Apparatus and method for producing multiple images
Assignee: AT&T Inc
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Filing: 1968-06-24
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Granted: 1971-06-15
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Expires: 1988-06-24
Abstract
Abstract Multiple images of a photolithography mask are produced, for simultaneously exposing a plurality of regions of a photoresist coating on a semiconductor substrate, by directing monochromatic light through the mask, collimating the light, and transmitting it through a first diffraction grating with vertical rulings and a second diffraction grating with horizontal rulings. The diffraction gratings each divide the light into a plurality of diffraction orders each containing the image to be recorded; and each of these images is imaged on the photoresist coating.
Inventors
- 👤 Donald R Herriott
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 19:51
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70425; G03F7/70466; G02; G02B; G02B27/00; G02B27/42; G02B27/4205; G02B27/4222; G03F7/70216; G03F7/70275; H; H10; H10P; H10P76/00; H10P76/20; H10P76/204; H10P76/2041; H10P76/2042; G02B27/10; G02B27/1086
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
43 words
The apparatus of claim 1 wherein: the first diffraction grating comprises a plurality of rulings extending in a first direction; and the second diffraction grating comprises a plurality of rulings extending in a second direction which is substantially orthogonal to the first direction.
Claim 2
Dependent Claim
101 words
In a process for making semiconductor devices which includes the step of exposing a plurality of regions of a photoresist coating on a semiconductor substrate with the image of a mask containing a pattern, the improvement comprising: projecting substantially monochromatic light through a mask; collimating the light; diffracting the light into a plurality of first diffraction orders each containing an image of the mask; diffracting each of the first diffraction orders into a plurality of second diffraction orders each containing an image of the mask; and imaging each of the second diffraction orders onto the photoresist coating of the semiconductor substrate.
Claim 3
Dependent Claim
105 words
The apparatus of claim 1 wherein: each of the mask pattern images contained on each of the first diffraction orders subtends a first angle; each of said first diffraction orders having a separation of at least a second angle; said first angle being smaller than said second angle, whereby said multiple images do not overlap; each of said mask pattern images contained on said second diffraction orders subtending a third angle; each of said second diffraction orders having a separation of at least a fourth angle; and said third angle being smaller than said fourth angle, whereby said multiple mask pattern images do not overlap.
Claim 4
Dependent Claim
76 words
The apparatus of claim 1 wherein said first diffraction grating contains rulings that extend in a first direction; said second grating containing rulings that extend in a second direction orthogonal to said first direction; said rulings on said first and second gratings are substantially identical parallel grooves on a substantially transparent medium; and said grooves have a curvature such as to diffract light of substantially equal intensity along the paths of a plurality of diffraction orders.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-06-14 | 1974-12-14 | 1975-06-15 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-06-14 | 1978-12-14 | 1979-06-15 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-06-14 | 1982-12-14 | 1983-06-15 | $7700.00 | Window Closed / Lapsed |