Photoresist-forming compositions
Abstract
Abstract A PHOTORESIST-FORMING COMPOSITION COMPRSISING A PHOTO ACTIVATOR HAVING A POLYCHLORINATED OR POLYBROMINATED METHYL GROUP CAPABLE OF FORMING A FREE RADICAL BY THE ACTION OF LIGHT AND A HOMOPOLYMER OR A CO-POLYMER WITH OTHER VINYL MONOMER, OF A MONOMER REPRESENTED BY THE GENERAL FORMULA -CH(-A)-C(-R1)(-X-N(-R2)-(2-R3-1,3-PHENYLENE)-R4)- OR -CH2-C(-R1)(-N(-R2)-(2-R3-1,3-PHENYLENE)-R4)- WHEREIN A IS A HYDROGEN ATOM, A CARBOXYLIC ACID OR CARBOXYLIIC ACID AMIDE; X IS-COOCH2CH2-, -CONHCH2CH2- -COSCH2CH2, -CONH-, -CH2-, -OSO2NH-, -OSO2OO-, -CONHO-; R1 IS A HYDROGEN ATOM OR A LOWER ALKYL GROUP: R1 HYDROGEN ATOM, A LOWER ALKYL GROUP OR A SUBSTITUTED OR UNSUBSTITUTED PHENYL GROUP; AND R3 AND R4 ARE INDIVIDUALLY A HYDROGEN ATOM OR A LOWER ALKYL GROUP, PROVIDED THAT IN THE CASE OF THE FORMULA II, R2 AND R3 MAY FORM A HETEROCYCLIC RING TOGETHER WITH NITROGEN AND THE BENZENE RING, AND R3 AND R4 MAY FORM A NAPHTHALENE RING TOGETHER WITH THE BENZENE RING.
Inventors
- 👤 Motoo Kogure
- 👤 Shoichiro Hoshino
Bibliographic Details
Claims Analysis
Total Claims: 0References Cited (Backward Citations)
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