Photosensitive coating systems

Abstract

Abstract ETHYLENICALLY UNSATURATED DERIVATIVES OF SUBSITUTED BENZOIC ACIDS, PHENOLS AND NAPHTHOIC ACIDS WHICH ARE PREPARED BY MEANS OF A METHOD INVOLVING REACTING THE SUBSTITUTED ACID OR PHENOL WITH AN ETHYLENICALLY UNSATURATED REAGENT SUCH AS GLYCIDYL ACRYLATE AND GLYCIDYL METHACRYLATE. THE RESULTING MONOMERS MAY, THEREAFTER, BE HOMO- OR COPOLYMERIZED WITH A WIDE VARIETY OF CONVENTIONAL ETHYLENICALLY UNSATURATED, I.E. VINYL, MONOMERS. AS A RESULT OF THE PRESENCE OF SUCH MONOMERS, THE RESULTING HOMO- AND COPOLYMERS ARE SENSITIVE TO EXTERNAL STIMULI SUCH AS ULTRA-VIOLET AND VISIBLE LIGHT AND WILL READILY CROSSLINK UPON EXPOSURE TO SUCH STIMULI. ORGANIC SOLVENT SOLUTIONS OR AQUEOUS EMULSIONS OF THESE COPOLYMERS MAY BE DEPOSITED UPON SOLID SUBSTRATES THEREBY PROVIDING PHOTOSENSITIVE COATING SYSTEMS WHICH ARE SUITABLE FOR USE IN THE LITHOGRAPHIC AND CHEMICAL MILLING FIELDS.

Inventors

• 👤 Martin Skoultchi

Bibliographic Details