US3558376A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method for controlled doping by gas of foreign substance into semiconductor materials
Assignee: Siemens AG
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Filing: 1967-01-05
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Granted: 1971-01-26
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Expires: 1987-01-05
Abstract
Abstract CONTROLLED PROCESS FOR INTRODUCING FOREIGH SUBSTANCES, E.G. DOPANTS AND RECOMBINATION CENTERS, INTO A MOLTEN SEMICONDUCTOR BODY BY DIRECTING FOREIGN SUBSTANCE IN GASEOUS FORM IN THE IMMEDIATE VICINITY OF THE MELT.
Inventors
- 👤 Otto Schmidt
- 👤 Klaus Wartenberg
- 👤 Konrad Reuschel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 04:32
CPC Classifications
C; C30; C30B; C30B11/00; C30B11/04; C30B11/06; C30B13/00; C30B13/08; C30B13/10; C30B13/12; Y; Y10; Y10S; Y10S117/00; Y10S117/906; Y10S118/00; Y10S118/90; Y10S252/00; Y10S252/95; Y10S252/951
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-01-25 | 1974-07-27 | 1975-01-26 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-01-25 | 1978-07-27 | 1979-01-26 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-01-25 | 1982-07-27 | 1983-01-26 | $7700.00 | Window Closed / Lapsed |