US3553037A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Gas diffusion method for fabricating semiconductor devices
Assignee: Stewart Warner Corp
•
Filing: 1968-04-05
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Granted: 1971-01-05
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Expires: 1988-04-05
Abstract
Abstract A SUPPORTING DEVICE FOR SEMICONDUCTOR WAFERS TO BE USED DURING DEPOSITION AND DIFFUSION PROCESS STEPS BY WHICH THE WAFERS AE ORIENTED AT AN UPWARD SLOPING ANGLE IN THE DIRECTION OF GAS FLOW. THE WAFERS ARE LOADED ON THE DEVICES SO THAT THE SURFACES AT WHICH THE SEMICONDUCTOR DEVICES ARE BEING FABRICATED ARE FACING DOWNWARD AND TOWARDS THE DOWNSTREAM END TO THEREBY PROVIDE AN EVEN GAS FLOW ACROSS THE FACE OF EACH WAFER AND PREVENT THE DEPOSIT ON THE DESIRED SURFACES OF ANY CONTAMINANTS WHICH MIGHT BE KNOCKED LOOSE FROM THE INTERIOR SURFACE OF THE REACTION TUBE.
Inventors
- 👤 Harvey W Bell
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 23:21
CPC Classifications
C; C30; C30B; C30B31/00; C30B31/06; C30B31/14; C30B31/16; Y; Y10; Y10S; Y10S118/00; Y10S118/90
Claims Analysis
Total Claims: 0
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References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-01-04 | 1974-07-06 | 1975-01-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-01-04 | 1978-07-06 | 1979-01-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-01-04 | 1982-07-06 | 1983-01-05 | $7700.00 | Window Closed / Lapsed |