Apparatus for depositing ionized electron beam evaporated material on a negatively biased substrate

Claim 1

AN ION CLEANING AND DEPOSITION APPARATUS COMPRISING: A. A VACUUM CHAMBER, B. PUMPING MEANS FOR CREATING A VACUUM WITHIN SAID CHAMBER, C. A TUBULAR MAGNET WITHIN SAID CHAMBER, SAID MAGNET BEING MAGNETIZED TO PRODUCE A LONGITUDINAL FLUX FIELD WITHIN THE BORE OF SAID MAGNET, D. A CIRCULAR CATHODE ELEMENT POSITIONED WITHIN THE BORE OF SAID MAGNET AND PERPENDICULAR TO THE CENTER LINE OF SAID BORE, E. ELECTRICAL MEANS COUPLED TO SAID CATHODE ELEMENT FOR HEATING SAID ELEMENT WHEREIN AN ELECTRON FLOW IS EMITTED FROM SAID ELEMENT, F. AN ELECTRICALLY CONDUCTIVE ANODE POSITIONED WITHIN THE BORE OF SAID MAGNET AND SPACED FROM SAID CATHODE ELEMENT, THE CENTER OF SAID ANODE BEING ALIGNED SO THAT A CHARGE PLACED IN SAID ANODE WILL BE LOCATED UPON THE CENTER LINE OF SAID FLUX FIELD, G. ELECTRICAL MEANS COUPLED TO SAID ANODE FOR POLARIZING SAID ANODE WITH RESPECT TO SAID CATHODE ELEMENT CAUSING ELECTRON FLOW TO BE EMITTED BY SAID CATHODE ELEMENT AND ACCELERATED THROUGH THE MAGNETIC CONDUIT PRODUCED BY SAID FLUX FIELD TO THE CHARGE IN SAID ANODE HEATING AND VAPORIZING THE SURFACE OF SAID CHARGE AND CAUSING SAID VAPORS TO BE IONIZED BY BOMBARDMENT FROM SAID ELECTRON FLOW, H. ADJUSTMENT MEANS ASSOCIATED WITH SAID ANODE FOR ADJUSTING THE POSITION OF SAID CHARGE ALONG THE CENTER LINE OF SAID FLUX FIELD, I. A SUBSTRATE SUPPORT WITHIN SAID CHAMBER AND POSITIONED EXTERNALLY OF SAID BORE OF SAID MAGNET AND SUBSTANTIALLY ON A LINE EXTENDING FROM THE CENTER OF SAID ANODE AND THROUGH SAID CIRCULAR CATHODE ELEMENT TO SAID SUPPORT, AND J. ELECTRICAL MEANS COUPLED TO SAID SUBSTRATE SUPPORT FOR APPLYING A VARIABLE POTENTIAL TO SAID SUPPORT WHEREBY A SUBSTRATE MAY BE BOMBARDED WITH IONS AT A VARIABLE ENERGY.