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US3386901A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of forming an electrolytically etched plate

Assignee: YOUNG RES LAB Ltd
•
Filing: 1965-02-19
•
Granted: 1968-06-04
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Expires: 1985-02-19
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Abstract

No abstract record available.

Inventors

  • 👤 Young Lawrence John

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-02 07:30
CPC Classifications
C; C25; C25F; C25F3/00; C25F3/02; C25F3/14; C23; C23F; C23F1/00; C23F1/02

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 163 words
A METHOD OF FORMING AN ETCHED PLATE HAVING A RAISED PATTERN, WHICH METHOD COMPRISES APPLYING TO THE FACE OF A PLATE OF ETCHABLE METAL A COATING OF A RESIST IN A PATTERN CORRESPONDING TO THAT OF THE DESIRED RAISED PATTERN, ETCHING AWAY METAL FROM THOSE AREAS NOT COVERED BY THE RESIST TO THE AREAS COVERED BY THE RESIST, STOPPINGN THE ETCHING PROCESS BEFORE A SIGNIFICANT AMOUNT OF UNCERCUTTING HAS TAKEN PLACE, PROVIDING THE NEWLY FORMED SIDE WALLS WITH A PROTECTIVE SURFACE, ETCHING AWAY FURTHER METAL FROM THOSE AREAS NOT COVERED BY THE RESIST TO FORM FURTHER ETCHED PROCESS BEFORE A SIGNIFICANT AMOUNT OF UNDERCUTTING HAS TAKEN PLACE AND THEREAFTER SUBJECTING THE ETCHED PLATE TO A FURTHER ETCHING STEP WHEREBY THE SHOULDER WHICH IS FORMED BETWEEN THE FIRST AND SECOND SIDEWALLS IS ETCHED AWAY TO PROVIDE AN ETCHED PLATE HAVING THE DESIRED RAISED PATTERN AND A SUBSTANTIALLY SMOOTH SURFACE BETWEEN THE FACE OF THE RAISED PATTERN AND THE GENERAL LEVEL OF THE ETCHED PLATE.
Claim 2
Independent Claim 163 words
A METHOD OF FORMING AN ETCHED PLATE HAVING A RAISED PATTERN, WHICH METHOD COMPRISES APPLYING TO THE FACE OF A PLATE OF ETCHABLE METAL A COATING OF A RESIST IN A PATTERN CORRESPONDING TO THAT OF THE DESIRED RAISED PATTERN, ETCHING AWAY METAL FROM THOSE AREAS NOT COVERED BY THE RESIST TO THE AREAS COVERED BY THE RESIST, STOPPINGN THE ETCHING PROCESS BEFORE A SIGNIFICANT AMOUNT OF UNCERCUTTING HAS TAKEN PLACE, PROVIDING THE NEWLY FORMED SIDE WALLS WITH A PROTECTIVE SURFACE, ETCHING AWAY FURTHER METAL FROM THOSE AREAS NOT COVERED BY THE RESIST TO FORM FURTHER ETCHED PROCESS BEFORE A SIGNIFICANT AMOUNT OF UNDERCUTTING HAS TAKEN PLACE AND THEREAFTER SUBJECTING THE ETCHED PLATE TO A FURTHER ETCHING STEP WHEREBY THE SHOULDER WHICH IS FORMED BETWEEN THE FIRST AND SECOND SIDEWALLS IS ETCHED AWAY TO PROVIDE AN ETCHED PLATE HAVING THE DESIRED RAISED PATTERN AND A SUBSTANTIALLY SMOOTH SURFACE BETWEEN THE FACE OF THE RAISED PATTERN AND THE GENERAL LEVEL OF THE ETCHED PLATE.
Claim 3
Dependent Claim 36 words
A METHOD OF FORMING AN ETCHED PLATE AS CLAIMED IN CLAIM 1 WHEREIN THE ETCHING STEPS ARE CARRIED OUT ELECTROLYTICALLY, THE METAL PLATE WITH ITS COATING OF RESIST BEING MADE AN ELECTRODE IN AN ELECTROLYTIC BATH.

References Cited (Backward Citations)

US1376365A Cited
US2695351A Cited
US3031302A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1971-06-04 1971-12-04 1972-06-04 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1975-06-04 1975-12-04 1976-06-04 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1979-06-04 1979-12-04 1980-06-04 $7700.00 Window Closed / Lapsed

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