US3287129A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Light-sensitive photographic elements containing developing agent precursors
Assignee: Eastman Kodak Co
•
Filing: 1963-01-16
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Granted: 1966-11-22
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Expires: 1983-01-16
Abstract
No abstract record available.
Inventors
- 👤 William W Rees
- 👤 Jr John W Gates
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 08:13
CPC Classifications
C; C07; C07C; C07C49/00; C07C49/587; C07C49/703; C07C49/723; C07C49/727; C07C49/737; C07C49/613; C07C49/617; C07C49/623; C07C49/637; C07C49/643; C07C49/657; C07C49/683; C07C49/687; C07C49/693; G; G03; G03C; G03C1/00; G03C1/005; G03C1/06; G03C1/34; G03C1/42; G03C5/00; G03C5/26; G03C5/29; G03C5/30; G03C5/3021; G03C5/315
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
39 words
A PHOTOGRAPHIC ELEMENT COMPRISING A SUPPORT AND A PHOTOGRAPHIC SILVER HALIDE EMULSION LAYER, AND INTEGRAL WITH SAID PHOTOGRAPHIC ELEMENT A WATER-PERMEABLE HYDROPHILIC COLLOID LAYER CONTAINING A COMPOUND SELECTED FROM THE CLASS OF COMPOUNDS REPRESENTED BY THE FOLLOWING GENERAL FORMULAS:
Claim 2
Dependent Claim
39 words
A PHOTOGRAPHIC ELEMENT COMPRISING A SUPPORT AND A PHOTOGRAPHIC SILVER HALIDE EMULSION LAYER, AND INTEGRAL WITH SAID PHOTOGRAPHIC ELEMENT A WATER-PERMEABLE HYDROPHILIC COLLOID LAYER CONTAINING A COMPOUND SELECTED FROM THE CLASS OF COMPOUNDS REPRESENTED BY THE FOLLOWING GENERAL FORMULAS:
Claim 3
Dependent Claim
211 words
A PROCESS FOR FORMING A PHOTORESIST COMPRISING EXPOSNG A PHOTOGRAPHIC SILVER HALIDE EMULSION LAYER CONTAINING A COMPOUND SELECTED FROM THE CLASS OF COMPOUNDS REPRESENTED BY THE FOLLOWING GENERAL FORMULAS: 2-R1,3-R2,5-R3,5,8-(-X-),6-R4,7-R5,8-R6-1,4,4A,5,8,8AHEXAHYDRONAPHTHALENE -1,4-DIONE AND 1,3,6-TRI(R4-),2,4,7-TRI(R5-),5-R3,5,8-(-X-),8-R6-5,8,8A, 9,10,10A-HEXAHYDROANTHRACENE-9,10-DIONE WHEREIN R1 AND R2 REPRESENT A MEMBER SELECTED FROM THE CLASS CONSISTING OF HYDROGEN, AN ALKYL GROUP FROM 1 TO 20 CARBON ATOMS, AN ARYL GROUP, HYDROXY, A SULFONIC ACID GROUP, HALOGEN, AMINO AND A SUBSTITUTED THIO GROUP -S-Y, WHEREIN Y REPRESENTS A MEMBER SELECTED FROM THE CLASS CONSISTING OF AN ISOCYCLIC GROUP AND A HETEROCYCLIC GROUP, WHEREIN R3, R4, R5 AND R6 REPRESENT A MEMBER SELECTED FROM THE CLASS CONSISTING OF HYDROGEN HALOGEN, AN ARYL GROUP AND A LOWER ALKYL GROUP; X REPRESENTS A MEMBER SELECTED FROM THE CLASS CONSISTING OF A HYDROEN ON EACH OF THE 5 AND 8 CARBON ATOMS, A METHYLENE ATTACHED TO THE 5 AND 8 CARBON ATOMS, AN ETHYLENE GROUP ATTACHED TO THE 5 AND 8 CARBON ATOMS AND METHYLENE AND ETHYLENE GROUPS, SAID METHYLENE AND ETHYLENE GROUPS ATTACHED TO THE FIVE AND EIGHT CARBON ATOMS SUBSTITUTED WITH A MEMBER OF THE GROUP SELECTED FROM THE CLASS CONSISTING OF A HALOGEN, AN ARYL GROUP, AND LOWER ALKYL GROUPS, DEVELOPING IN AN ALKALINE BATH, AND REMOVING THE UNTANNED AREAS IN WARM WATER.
Claim 4
Dependent Claim
211 words
A PROCESS FOR FORMING A PHOTORESIST COMPRISING EXPOSNG A PHOTOGRAPHIC SILVER HALIDE EMULSION LAYER CONTAINING A COMPOUND SELECTED FROM THE CLASS OF COMPOUNDS REPRESENTED BY THE FOLLOWING GENERAL FORMULAS: 2-R1,3-R2,5-R3,5,8-(-X-),6-R4,7-R5,8-R6-1,4,4A,5,8,8AHEXAHYDRONAPHTHALENE -1,4-DIONE AND 1,3,6-TRI(R4-),2,4,7-TRI(R5-),5-R3,5,8-(-X-),8-R6-5,8,8A, 9,10,10A-HEXAHYDROANTHRACENE-9,10-DIONE WHEREIN R1 AND R2 REPRESENT A MEMBER SELECTED FROM THE CLASS CONSISTING OF HYDROGEN, AN ALKYL GROUP FROM 1 TO 20 CARBON ATOMS, AN ARYL GROUP, HYDROXY, A SULFONIC ACID GROUP, HALOGEN, AMINO AND A SUBSTITUTED THIO GROUP -S-Y, WHEREIN Y REPRESENTS A MEMBER SELECTED FROM THE CLASS CONSISTING OF AN ISOCYCLIC GROUP AND A HETEROCYCLIC GROUP, WHEREIN R3, R4, R5 AND R6 REPRESENT A MEMBER SELECTED FROM THE CLASS CONSISTING OF HYDROGEN HALOGEN, AN ARYL GROUP AND A LOWER ALKYL GROUP; X REPRESENTS A MEMBER SELECTED FROM THE CLASS CONSISTING OF A HYDROEN ON EACH OF THE 5 AND 8 CARBON ATOMS, A METHYLENE ATTACHED TO THE 5 AND 8 CARBON ATOMS, AN ETHYLENE GROUP ATTACHED TO THE 5 AND 8 CARBON ATOMS AND METHYLENE AND ETHYLENE GROUPS, SAID METHYLENE AND ETHYLENE GROUPS ATTACHED TO THE FIVE AND EIGHT CARBON ATOMS SUBSTITUTED WITH A MEMBER OF THE GROUP SELECTED FROM THE CLASS CONSISTING OF A HALOGEN, AN ARYL GROUP, AND LOWER ALKYL GROUPS, DEVELOPING IN AN ALKALINE BATH, AND REMOVING THE UNTANNED AREAS IN WARM WATER.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1969-11-21 | 1970-05-23 | 1970-11-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1973-11-21 | 1974-05-23 | 1974-11-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1977-11-21 | 1978-05-23 | 1978-11-22 | $7700.00 | Window Closed / Lapsed |