US3277541A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photographic method of making a pattern for molding
Assignee: Individual
•
Filing: 1964-06-26
•
Granted: 1966-10-11
•
Expires: 1984-06-26
Abstract
No abstract record available.
Inventors
- 👤 Ralph P Wilton
- 👤 John J Fitzpatrick
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 07:26
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/0017; B; B22; B22C; B22C7/00; Y; Y10; Y10S; Y10S430/00; Y10S430/152; Y10T; Y10T156/00; Y10T156/10; Y10T156/1052; Y10T156/1062; Y10T29/00; Y10T29/49; Y10T29/4981; Y10T29/4998; Y10T29/49982
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
201 words
A METHOD OF FORMING A PATTERN OF AN ARTICLE HAVING A POSITIVE EMBOSSED DESIGN THEREON AND FORM WHICH A MOLD HAVING A NEGATIVE IMPRESSION OF SAID PATTERN MAY BE FORMED, SAID METHOD COMPRISING THE STEPS OF PREPARING A POSITIVE LINE DRAWING OF SAID DESIGN WHICH IS TO BE EMBOSSED UPON SAID PATTERN, PHOTOGRAPHING SAID LINE DRAWING AND FORMING A PRINT THEREOF HAVING AN OPAQUE BACKGROUND AND A TRANSPARENT POSITIVE IMAGE OF SAID DESIGN, PHOTOGRAPHING SAID PRINT UPON A METALLIC SHEET HAVING A PHOTO-SENSITIVE COATING TO TRANSFER THE POSITIVE DESIGN TO SAID COATING, CHEMICALLY ETCHING THE BACKGROUND AREAS BETWEEN THE LINES OF SAID DESIGN TO A DESIRED SUBSTANTIALLY UNIFORM DEPTH INTO SAID METAL SHEET, SAID DEPTH BEING SUBSTANTIAL AND SUFFICIENT A PROVIDE A POSITIVE EMBOSSMENT OF SAID DESIGN OF ADEQUATE HEIGHT ABOVE THE BACKGROUND THEREOF TO SERVE AS A PATTERN EMBOSSMENT WHICH WHEN TRANSFERRTED TO MOLDING MATERIAL WILL PRODUCE A MOLD CAVITY OF SUFFICIENT DEPTH TO FORM SAID EMBOSSED DESIGN UPON AN ARTICLE MOLDED FROM METAL POURED INTO SAID MOLD CAVITY, AND AFFIXING SAID EMBOSSMENT TO THE SURFACE OF THE BODY OF A PATTERN OF AN ARTICLE TO BE MOLDED WITH SAID DESIGN EMBOSSED THEREON TO COMPLETE THE FORMATION OF SAID PATTERN.
Claim 2
Independent Claim
201 words
A METHOD OF FORMING A PATTERN OF AN ARTICLE HAVING A POSITIVE EMBOSSED DESIGN THEREON AND FORM WHICH A MOLD HAVING A NEGATIVE IMPRESSION OF SAID PATTERN MAY BE FORMED, SAID METHOD COMPRISING THE STEPS OF PREPARING A POSITIVE LINE DRAWING OF SAID DESIGN WHICH IS TO BE EMBOSSED UPON SAID PATTERN, PHOTOGRAPHING SAID LINE DRAWING AND FORMING A PRINT THEREOF HAVING AN OPAQUE BACKGROUND AND A TRANSPARENT POSITIVE IMAGE OF SAID DESIGN, PHOTOGRAPHING SAID PRINT UPON A METALLIC SHEET HAVING A PHOTO-SENSITIVE COATING TO TRANSFER THE POSITIVE DESIGN TO SAID COATING, CHEMICALLY ETCHING THE BACKGROUND AREAS BETWEEN THE LINES OF SAID DESIGN TO A DESIRED SUBSTANTIALLY UNIFORM DEPTH INTO SAID METAL SHEET, SAID DEPTH BEING SUBSTANTIAL AND SUFFICIENT A PROVIDE A POSITIVE EMBOSSMENT OF SAID DESIGN OF ADEQUATE HEIGHT ABOVE THE BACKGROUND THEREOF TO SERVE AS A PATTERN EMBOSSMENT WHICH WHEN TRANSFERRTED TO MOLDING MATERIAL WILL PRODUCE A MOLD CAVITY OF SUFFICIENT DEPTH TO FORM SAID EMBOSSED DESIGN UPON AN ARTICLE MOLDED FROM METAL POURED INTO SAID MOLD CAVITY, AND AFFIXING SAID EMBOSSMENT TO THE SURFACE OF THE BODY OF A PATTERN OF AN ARTICLE TO BE MOLDED WITH SAID DESIGN EMBOSSED THEREON TO COMPLETE THE FORMATION OF SAID PATTERN.
References Cited (Backward Citations)
US36821A
Cited
US1143991A
Cited
US1806451A
Cited
US1792486A
Cited
US2003864A
Cited
US2474428A
Cited
US2743629A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1969-10-10 | 1970-04-11 | 1970-10-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1973-10-10 | 1974-04-11 | 1974-10-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1977-10-10 | 1978-04-11 | 1978-10-11 | $7700.00 | Window Closed / Lapsed |