US3246977A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Treatment of waste gases
Assignee: Hooker Chemical Corp
•
Filing: 1962-08-02
•
Granted: 1966-04-19
•
Expires: 1982-08-02
Abstract
No abstract record available.
Inventors
- 👤 Jr John H Hinkle
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 09:52
CPC Classifications
C; C01; C01B; C01B7/00; C01B7/19; C01B7/191
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
123 words
A PROCESS FOR TREATING A FLUORINE-CONTAINING GAS WHICH COMPRISES COMBINING AN OXYGEN-CONTAINING GAS SELECTED FROM THE GROUP CONSISTING OF OXYGEN, AIR AND MIXTURES THEREOF, WITH A GAS CONTAINING FLUORINE VALUES, SILICON VALUES AND COMBUSTIBLE ORGANIC IMPURITIES, MAINTAINING THE OXYGEN CONTENT OF THE GAS AT LESS THAN THE STOICHIOMETRIC PROPORTION OF OXYGEN BASED ON THE COMBUSTIBLE ORGANIC IMPURITIES, HEATING THE COMBINED GAS MIXTURE TO A TEMPERATURE WITHIN THE RANGE OF ABOUT 800 DEGREES TO 3,000 DEGREES FAHRENHEIT TO EFFECT COMBUSTION OF THE ORGANIC IMPURITIES IN THE GAS, EFFECTING FORMATION OF A CARBONACEOUS RESIDUE AS A RESULT OF THE INCOMPLETE COMBUSTION, SAID RESIDUE CONTAINING AT LEAST A PORTION OF THE SILICON VALUES ORIGINALLY PRESENT IN THE GAS, AND REMOVING THE THUS-FORMED RESIDUE FROM THE GAS.
Claim 2
Dependent Claim
123 words
A PROCESS FOR TREATING A FLUORINE-CONTAINING GAS WHICH COMPRISES COMBINING AN OXYGEN-CONTAINING GAS SELECTED FROM THE GROUP CONSISTING OF OXYGEN, AIR AND MIXTURES THEREOF, WITH A GAS CONTAINING FLUORINE VALUES, SILICON VALUES AND COMBUSTIBLE ORGANIC IMPURITIES, MAINTAINING THE OXYGEN CONTENT OF THE GAS AT LESS THAN THE STOICHIOMETRIC PROPORTION OF OXYGEN BASED ON THE COMBUSTIBLE ORGANIC IMPURITIES, HEATING THE COMBINED GAS MIXTURE TO A TEMPERATURE WITHIN THE RANGE OF ABOUT 800 DEGREES TO 3,000 DEGREES FAHRENHEIT TO EFFECT COMBUSTION OF THE ORGANIC IMPURITIES IN THE GAS, EFFECTING FORMATION OF A CARBONACEOUS RESIDUE AS A RESULT OF THE INCOMPLETE COMBUSTION, SAID RESIDUE CONTAINING AT LEAST A PORTION OF THE SILICON VALUES ORIGINALLY PRESENT IN THE GAS, AND REMOVING THE THUS-FORMED RESIDUE FROM THE GAS.
References Cited (Backward Citations)
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US2753253A
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US2944396A
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US2976141A
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1969-04-18 | 1969-10-18 | 1970-04-19 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1973-04-18 | 1973-10-18 | 1974-04-19 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1977-04-18 | 1977-10-18 | 1978-04-19 | $7700.00 | Window Closed / Lapsed |