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US3232800A Expired / Lapsed US ⏱️ 0.0 years remaining

Method of making semiconductor devices by forming a damage layer on a surface of a semiconductor body and then alloying through said damage layer

Assignee: NEC Corp
•
Filing: 1962-11-21
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Granted: 1966-02-01
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Expires: 1982-11-21
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Abstract

No abstract record available.

Inventors

  • 👤 Mihara Yoshinori
  • 👤 Abe Shigeru

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-26 14:57
CPC Classifications
H; H10; H10P; H10P95/00; H10P95/50; Y; Y10; Y10S; Y10S438/00; Y10S438/974

Claims Analysis

Total Claims: 0
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References Cited (Backward Citations)

US2900584A Cited
US3009841A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1969-01-31 1969-08-02 1970-02-01 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1973-01-31 1973-08-02 1974-02-01 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1977-01-31 1977-08-02 1978-02-01 $7700.00 Window Closed / Lapsed

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