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US3205043A Expired / Lapsed US ⏱️ 0.0 years remaining

Cold molded dense silicon carbide articles and method of making the same

Assignee: Unifrax I LLC
•
Filing: 1962-04-04
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Granted: 1965-09-07
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Expires: 1982-04-04
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Abstract

No abstract record available.

Inventors

  • 👤 Kenneth M Taylor

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 23:08
CPC Classifications
C; C04; C04B; C04B35/00; C04B35/515; C04B35/56; C04B35/565; C04B35/573

Claims Analysis

Total Claims: 4
Claim 1
Independent Claim 198 words
A DENSE ARTICLE OF MANUFACTURE COMPOSED SUBSTANTIALLY ENTIRELY OF SELF-BONDED SILICON CARBIDE, HAVING A DENSITY OF AT LEAST 3.00 AND CONTAINING IN ADDITION TO SILICON CARBIDE, AN OCCLUDED SMALL QUANTITY OF FREE SILICON NOT AMOUNTING TO MORE THAN 5 PERCENT BY WEIGHT OF SAID ARTICLE, AND MADE BY A PROCESS COMPRISING THE SEPARATE STEPS OF COLD PRESSING A POROUS MASS CONSISTING ESSENTIALLY OF GRANULAR SILICON CARBIDE INTO A SHAPE, THEN INTRODUCING A CONTROLLED AMOUNT OF CARBON INTO THE PORES OF THE SHAPED MASS, SAID CONTROLLED AMOUNT OF CARBON BEING BETWEEN 85 PERCENT AND 95 PERCENT OF THE STOICHIOMETRIC AMOUNT THAT IS REQUIRED TO REACT WITH SILICON TO FORM SUFFICIENT SILICON CARBIDE TO FILL THE PORES AND FORM A SOLID NON-POROUS BODY OF SILICON CARBIDE, AND THEN HEATING SAID SHAPED MASS TO A TEMPERATURE OF AT LEAST 2000*C. IN A SILICON SUPPLYING ENVIRONMENT ESSENTIALLY FREE OF SILICA TO CAUSE THE SILICON TO ENTER THE PORES OF THE SHAPED MASS AND REACT WITH THE INTRODUCED CABON TO FORM SILICON CARBIDE AND THEREAFTER MAINTAINING THE BODY AT A TEMPERATURE OF ABOUT 2100*C. TO 2300*C. FOR SUFFICIENT TIME TO CAUSE THE SILICON CARBIDE SO FORMED TO GO TO THE HEXAGONAL CRYSTALLINE FORM.
Claim 2
Dependent Claim 198 words
A DENSE ARTICLE OF MANUFACTURE COMPOSED SUBSTANTIALLY ENTIRELY OF SELF-BONDED SILICON CARBIDE, HAVING A DENSITY OF AT LEAST 3.00 AND CONTAINING IN ADDITION TO SILICON CARBIDE, AN OCCLUDED SMALL QUANTITY OF FREE SILICON NOT AMOUNTING TO MORE THAN 5 PERCENT BY WEIGHT OF SAID ARTICLE, AND MADE BY A PROCESS COMPRISING THE SEPARATE STEPS OF COLD PRESSING A POROUS MASS CONSISTING ESSENTIALLY OF GRANULAR SILICON CARBIDE INTO A SHAPE, THEN INTRODUCING A CONTROLLED AMOUNT OF CARBON INTO THE PORES OF THE SHAPED MASS, SAID CONTROLLED AMOUNT OF CARBON BEING BETWEEN 85 PERCENT AND 95 PERCENT OF THE STOICHIOMETRIC AMOUNT THAT IS REQUIRED TO REACT WITH SILICON TO FORM SUFFICIENT SILICON CARBIDE TO FILL THE PORES AND FORM A SOLID NON-POROUS BODY OF SILICON CARBIDE, AND THEN HEATING SAID SHAPED MASS TO A TEMPERATURE OF AT LEAST 2000*C. IN A SILICON SUPPLYING ENVIRONMENT ESSENTIALLY FREE OF SILICA TO CAUSE THE SILICON TO ENTER THE PORES OF THE SHAPED MASS AND REACT WITH THE INTRODUCED CABON TO FORM SILICON CARBIDE AND THEREAFTER MAINTAINING THE BODY AT A TEMPERATURE OF ABOUT 2100*C. TO 2300*C. FOR SUFFICIENT TIME TO CAUSE THE SILICON CARBIDE SO FORMED TO GO TO THE HEXAGONAL CRYSTALLINE FORM.
Claim 3
Independent Claim 92 words
A METHOD OF MAKING A HIGH DENSITY SILICON CARBIDE ARTICLE OF MANUFACTURE HAVING A DENSITY OF AT LEAST 3.00, WHICH COMPRISES THE SEPARATE STEPS OF COLD PRESSING A POROUS MASS CONSISTING ESSENTIALLY OF GRANULAR SILICON CARBIDE INTO A SHAPE, THEN INTRODUCING A CONTROLLED AMOUNT OF CARBON INTO THE PORES OF THE SHAPED MASS, AND THEN HEATING THE SHAPED MASS IN A SILICON SUPPLYING ENVIRONMENT THAT IS ESSENTIALLY FREE OF SILICA TO CAUSE THE SILICON TO ENTER THE PORES OF THE SHAPED MASS AND REACT WITH THE INTRODUCED CARBON TO FORM SILICON CARBIDE.
Claim 4
Independent Claim 92 words
A METHOD OF MAKING A HIGH DENSITY SILICON CARBIDE ARTICLE OF MANUFACTURE HAVING A DENSITY OF AT LEAST 3.00, WHICH COMPRISES THE SEPARATE STEPS OF COLD PRESSING A POROUS MASS CONSISTING ESSENTIALLY OF GRANULAR SILICON CARBIDE INTO A SHAPE, THEN INTRODUCING A CONTROLLED AMOUNT OF CARBON INTO THE PORES OF THE SHAPED MASS, AND THEN HEATING THE SHAPED MASS IN A SILICON SUPPLYING ENVIRONMENT THAT IS ESSENTIALLY FREE OF SILICA TO CAUSE THE SILICON TO ENTER THE PORES OF THE SHAPED MASS AND REACT WITH THE INTRODUCED CARBON TO FORM SILICON CARBIDE.

References Cited (Backward Citations)

US913324A Cited
US966399A Cited
US1013701A Cited
US992698A Cited
US1266478A Cited
US2188693A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1968-09-06 1969-03-08 1969-09-07 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1972-09-06 1973-03-08 1973-09-07 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1976-09-06 1977-03-08 1977-09-07 $7700.00 Window Closed / Lapsed

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