Method of making gravure relief images

Claim 1

A METHOD OF PREPARING A GRAVURE ETCHING RESIST FOR A GRAVURE CYLINDER FROM CONTINUOUS TONE COPY AND LINE COPY INCLUDING THE STEPS OF MOUNTING SAID CONTINUOUS TONE COPY AND SAID LINE COPY IN THE PROPER REGISTRY RELATIVE TO EACH OTHER WITH AT LEAST SAID CONTINUOUS TONE COPY ON A FLUORESCENT BACKGROUND AT A COPYING PLANE AND WITH A PHOTOSENSITIVE ETCHING RESIST AT AN EXPOSURE PLANE SPACED FROM SAID COPYING PLANE, EXPOSING SAID COPY TO A WHITE LIGHT SOURCE HAVING A HIGH CONTENT IN THE ULTRAVIOLET AND NEAR ULTRA-VIOLET PORTIONS OF THE SPECTRUM TO FULLY EXPOSE SAID PHTOSENSITIVE ETCHING RESIST IN A NEGATIVE IMAGE IN DIRECT PROPORTION TO THE TONAL VALUES OF SAID CONTINUOUS TONE COPY AND TO PARTIALLY EXPOSE SAID PHOTOSENSITIVE ETCHING RESIST IN A DROP-OUT REGION CORRESPONDING TO SAID FLUORESCENT BACKGROUND, PLACING A FILTER BETWEEN SAID COPYING PLANE AND SAID EXPOSURE PLANE TO CUT OFF REFLECTED LIGHT FROM SAID COPYING PLANE IN THE ULTRA-VIOLET AND NEAR ULTRA-VIOLET PORTION OF THE SPECTRUM, EXPOSING SAID CONTINUOUS TONE COPY AND SAID FLUORESCENT BACKGROUND TO A SUBSTANTIALLY ULTRA-VIOLET LIGHT SOURCE TO FULLY EXPOSE SAID PHOTOSENSITIVE ETCHING RESIST IN SAID DROP-OUT REGION AND TO PROVIDE A NEGATIVE IMAGE OF SAID LINE COPY, AND THEREAFTER PHOTOGRAPHICALLY DEVELOPING SAID PHOTOSENSITIVE ETCHING RESIST SUCH THAT THE DEVELOPED RESIST WILL PRODUCE A GRAVURE ECTHING RESIST HAVING VARYING THICKNESSES OF SAID GRAVURE ETCHING RESIST HARDENED IN PROPORTION TO SAID CONTINUOUS TONE AND LINE COPY.

Claim 2

A METHOD OF PREPARING A GRAVURE ETCHING RESIST FOR A GRAVURE CYLINDER FROM CONTINUOUS TONE COPY AND LINE COPY INCLUDING THE STEPS OF MOUNTING SAID CONTINUOUS TONE COPY AND SAID LINE COPY IN THE PROPER REGISTRY RELATIVE TO EACH OTHER WITH AT LEAST SAID CONTINUOUS TONE COPY ON A FLUORESCENT BACKGROUND AT A COPYING PLANE AND WITH A PHOTOSENSITIVE ETCHING RESIST AT AN EXPOSURE PLANE SPACED FROM SAID COPYING PLANE, EXPOSING SAID COPY TO A WHITE LIGHT SOURCE HAVING A HIGH CONTENT IN THE ULTRAVIOLET AND NEAR ULTRA-VIOLET PORTIONS OF THE SPECTRUM TO FULLY EXPOSE SAID PHTOSENSITIVE ETCHING RESIST IN A NEGATIVE IMAGE IN DIRECT PROPORTION TO THE TONAL VALUES OF SAID CONTINUOUS TONE COPY AND TO PARTIALLY EXPOSE SAID PHOTOSENSITIVE ETCHING RESIST IN A DROP-OUT REGION CORRESPONDING TO SAID FLUORESCENT BACKGROUND, PLACING A FILTER BETWEEN SAID COPYING PLANE AND SAID EXPOSURE PLANE TO CUT OFF REFLECTED LIGHT FROM SAID COPYING PLANE IN THE ULTRA-VIOLET AND NEAR ULTRA-VIOLET PORTION OF THE SPECTRUM, EXPOSING SAID CONTINUOUS TONE COPY AND SAID FLUORESCENT BACKGROUND TO A SUBSTANTIALLY ULTRA-VIOLET LIGHT SOURCE TO FULLY EXPOSE SAID PHOTOSENSITIVE ETCHING RESIST IN SAID DROP-OUT REGION AND TO PROVIDE A NEGATIVE IMAGE OF SAID LINE COPY, AND THEREAFTER PHOTOGRAPHICALLY DEVELOPING SAID PHOTOSENSITIVE ETCHING RESIST SUCH THAT THE DEVELOPED RESIST WILL PRODUCE A GRAVURE ECTHING RESIST HAVING VARYING THICKNESSES OF SAID GRAVURE ETCHING RESIST HARDENED IN PROPORTION TO SAID CONTINUOUS TONE AND LINE COPY.