← Back to Patent Explorer
US3167461A Expired / Lapsed US ⏱️ 0.0 years remaining

Process of preparing degenerately doped semiconductor source material

Assignee: International Business Machines Corp
•
Filing: 1960-12-30
•
Granted: 1965-01-26
•
Expires: 1980-12-30
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

No abstract record available.

Inventors

  • 👤 Dinsdale M J Compton

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 21:02
CPC Classifications
H; H10; H10D; H10D8/00; H10D8/01; H10D8/053; H10P; H10P32/00; H10P32/10; H10P32/14; H10P32/17; H10P32/171; H10P32/19; H10D8/70; H10D8/75; Y; Y10; Y10S; Y10S148/00; Y10S148/04; Y10S148/049; Y10S252/00; Y10S252/95; Y10S252/951; Y10S438/00; Y10S438/914; Y10S438/925

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 106 words
A METHOD OF FORMING ESAKI DIODES BY VAPOR GROWTH, WHICH COMPRISES THE REACTION OF A TRANSPORT ELEMENT WITH A SOURCE OF SEMICONDUCTOR MATERIAL AND THE DECOMPOSITION OF THE PRODUCTS OF THE REACTION TO FORM AN EPITAXIAL CRYSTALLINE GROWTH ON A SUBSTRATE, WHEREIN SUCH METHOD IT IS REQUIRED THAT THE SOURCE MATERIAL BE HOMOGENEOUSLY AND DEGENERATELY DOPED ON THE ORDER OF AT LEAST 1X10**19 A./CC., FURTHER COMPRISING THE PREPARATION OF SAID SOURCE MATERIAL BY THE STEPS OF DIVIDING A QUANTITY OF SAID SEMICONDUCTOR MATERIAL INTO A FINE POWDER AND DIFFUSING AN IMPURITY AGENT INTO SAID FINE POWDER WHEREBY HOMOGENEOUS, DEGENERATE, DOPING OF THE SOURCE MATERIAL IS OBTAINED.
Claim 2
Independent Claim 106 words
A METHOD OF FORMING ESAKI DIODES BY VAPOR GROWTH, WHICH COMPRISES THE REACTION OF A TRANSPORT ELEMENT WITH A SOURCE OF SEMICONDUCTOR MATERIAL AND THE DECOMPOSITION OF THE PRODUCTS OF THE REACTION TO FORM AN EPITAXIAL CRYSTALLINE GROWTH ON A SUBSTRATE, WHEREIN SUCH METHOD IT IS REQUIRED THAT THE SOURCE MATERIAL BE HOMOGENEOUSLY AND DEGENERATELY DOPED ON THE ORDER OF AT LEAST 1X10**19 A./CC., FURTHER COMPRISING THE PREPARATION OF SAID SOURCE MATERIAL BY THE STEPS OF DIVIDING A QUANTITY OF SAID SEMICONDUCTOR MATERIAL INTO A FINE POWDER AND DIFFUSING AN IMPURITY AGENT INTO SAID FINE POWDER WHEREBY HOMOGENEOUS, DEGENERATE, DOPING OF THE SOURCE MATERIAL IS OBTAINED.

References Cited (Backward Citations)

US2921905A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1968-01-26 1968-07-27 1969-01-26 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1972-01-26 1972-07-27 1973-01-26 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1976-01-26 1976-07-27 1977-01-26 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag