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US3137587A Expired / Lapsed US ⏱️ 0.0 years remaining

Method and apparatus for the manufacture of semiconductor film-type hall generators

Assignee: Individual
•
Filing: 1961-11-07
•
Granted: 1964-06-16
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Expires: 1981-11-07
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Abstract

No abstract record available.

Inventors

  • 👤 Harry H Wieder

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-24 18:16
CPC Classifications
H; H10; H10N; H10N52/00; H10N52/01

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 111 words
THE FABRICATION OF SEMICONDUCTOR FILMS FOR HALL EFFECT GENERATORS COMPRISING: (A) CUTTING A SLAB OF HIGH PERMEABILITY FERRITE AND GRINDING AND POLISHING A SURFACE AREA OF SAID FERRITE SLAB INTO AN OPTICALLY FLAT PLATE, AND SCRUPULOUSLY CLEANING SAID SURFACE. (B) PLACING A SCRUPULOUSLY CLEANED GRAIN OF SEMICONDUCTOR MATERIAL ONTEH OPTICALLY FLAT SURFACE OF SAID FERRITE SLAB, (C) PLACING SAID FERRITE SLAB WITH GRAIN OF SEMICONDUCTOR MATERIAL THEREON WITHIN AN ENCLOSURE HAVING AN INERT ATMOSPHERE, (D) RAISING THE TEMPERATURE JOF SAID FERRITE SLAB SUFFICIENTLY TO LIQUIDFY SAID GRAIN OF SEMICONDUCTOR, AND MAINTAINING WITHIN SAID ENCLOSURE AN AMBIENT TEMPERATURE AT APPROXIMATELY HALF MEASURED IN CENTIGRADE THAT REQUIRED TO LIQUIDFY SAID GRAIN OF SEMICONDUCTOR,
Claim 2
Dependent Claim 111 words
THE FABRICATION OF SEMICONDUCTOR FILMS FOR HALL EFFECT GENERATORS COMPRISING: (A) CUTTING A SLAB OF HIGH PERMEABILITY FERRITE AND GRINDING AND POLISHING A SURFACE AREA OF SAID FERRITE SLAB INTO AN OPTICALLY FLAT PLATE, AND SCRUPULOUSLY CLEANING SAID SURFACE. (B) PLACING A SCRUPULOUSLY CLEANED GRAIN OF SEMICONDUCTOR MATERIAL ONTEH OPTICALLY FLAT SURFACE OF SAID FERRITE SLAB, (C) PLACING SAID FERRITE SLAB WITH GRAIN OF SEMICONDUCTOR MATERIAL THEREON WITHIN AN ENCLOSURE HAVING AN INERT ATMOSPHERE, (D) RAISING THE TEMPERATURE JOF SAID FERRITE SLAB SUFFICIENTLY TO LIQUIDFY SAID GRAIN OF SEMICONDUCTOR, AND MAINTAINING WITHIN SAID ENCLOSURE AN AMBIENT TEMPERATURE AT APPROXIMATELY HALF MEASURED IN CENTIGRADE THAT REQUIRED TO LIQUIDFY SAID GRAIN OF SEMICONDUCTOR,

References Cited (Backward Citations)

US2749596A Cited
US3026427A Cited
US3027468A Cited
US3038241A Cited
US3043722A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1967-06-16 1967-12-16 1968-06-16 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1971-06-16 1971-12-16 1972-06-16 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1975-06-16 1975-12-16 1976-06-16 $7700.00 Window Closed / Lapsed

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