Patent US4378497A successfully refreshed from Google Patents.
US3132046A
Expired / Lapsed
US
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Method for the deposition of thin films by electron bombardment
Assignee: SPACE TECHNOLOGY LAB Inc
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Filing: 1960-09-28
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Granted: 1964-05-05
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Expires: 1980-09-28
Abstract
No abstract record available.
Inventors
- 👤 Horace T Mann
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-22 18:32
CPC Classifications
B; B05; B05D; B05D1/00; B05D1/60; C; C23; C23C; C23C14/00; C23C14/04; C23C14/042; C23C14/048; H; H01; H01B; H01B1/00; B05D3/00; B05D3/06; B05D3/068; Y; Y10; Y10S; Y10S148/00; Y10S148/15; Y10S148/169; Y10S505/00; Y10S505/80; Y10S505/815; Y10S505/818; Y10S505/819
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
131 words
A METHOD OF FABRICATING A THIN-FILM METAL ELEMENT OF PREDETERMINED SIZE AND SHAPE ON A SUBSTRATE, SAID METHOD COMPRISING: DEPOSITING ON SAID SUBSTATE BY ELECTRON BEAM POLYMERIZATION A LAYER OF DIELECTRIC MATERIAL FORMED WITH AT LEAST ONE STEEP-SIDED DEPRESSION CORRESPONDING IN SIZE AND SHAPE TO SAID METAL ELEMENT, PLACING AN APERTURED MASKING MEMBER ADJACENT TO SAID DIELECTRIC LAYER WITH SAID DEPRESSION ALIGNED WITH AN APERTURE OF SAID MEMBER, SAID APERTURE ALSO BEING FORMED TO CORRESPOND IN SIZE AND SHAPE TO SAID METAL ELEMENT, AND VACUUM EVAPORATING METAL THROUGH SAID APERTURE FROM A SOURCE IN SUBSTANTIAL ALIGNMENT WITH SAID DEPRESSION AND SAID APERTURE TO FORM IN SAID DEPRESSION A METAL DEPOSIT OF A THICKNESS LESS THAN THE DEPTH OF SAID DEPRESSION, SAID DEPOSIT BEING CONTINUOUS ONLY IN THE BOTTOM OF SAID DEPRESSION.
Claim 2
Independent Claim
131 words
A METHOD OF FABRICATING A THIN-FILM METAL ELEMENT OF PREDETERMINED SIZE AND SHAPE ON A SUBSTRATE, SAID METHOD COMPRISING: DEPOSITING ON SAID SUBSTATE BY ELECTRON BEAM POLYMERIZATION A LAYER OF DIELECTRIC MATERIAL FORMED WITH AT LEAST ONE STEEP-SIDED DEPRESSION CORRESPONDING IN SIZE AND SHAPE TO SAID METAL ELEMENT, PLACING AN APERTURED MASKING MEMBER ADJACENT TO SAID DIELECTRIC LAYER WITH SAID DEPRESSION ALIGNED WITH AN APERTURE OF SAID MEMBER, SAID APERTURE ALSO BEING FORMED TO CORRESPOND IN SIZE AND SHAPE TO SAID METAL ELEMENT, AND VACUUM EVAPORATING METAL THROUGH SAID APERTURE FROM A SOURCE IN SUBSTANTIAL ALIGNMENT WITH SAID DEPRESSION AND SAID APERTURE TO FORM IN SAID DEPRESSION A METAL DEPOSIT OF A THICKNESS LESS THAN THE DEPTH OF SAID DEPRESSION, SAID DEPOSIT BEING CONTINUOUS ONLY IN THE BOTTOM OF SAID DEPRESSION.
References Cited (Backward Citations)
US2921006A
Cited
US2848359A
Cited
US2898241A
Cited
US2937351A
Cited
US2932591A
Cited
US2936435A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1967-05-05 | 1967-11-04 | 1968-05-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1971-05-05 | 1971-11-04 | 1972-05-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1975-05-05 | 1975-11-04 | 1976-05-05 | $7700.00 | Window Closed / Lapsed |