Method of making photographic polymeric resist images

Claim 1

A METHOD OF PRODUCING DIRECT POSITIVE PHOTOGRAPHIC POLYMERIC RESIST IMAGES WHICH COMPRISES SUBJECTING TO A SINGLE IMAGEWISE EXPOSURE WITH RADIANT ENERGY IN THE SPECTRAL REGION OF ULTRA VIOLET TO VISIBLE LIGHT A PHOTOGRAPHIC ELEMENT COATED ON A SUITABLE SUPPORT IN THE FORM OF A LAYER COMPRISING AN ETHYLENICALLY UNSATURATED WATER SOLUBLE MONOMER CONTAINING THE TERMINAL GROUPING CH=C= WHICH IS DIRECTLY ATTACHED TO A NEGATIVE GROUP, A HYDROPHILIC PHOTOGRAPHIC COLLODIAL CARRIER MATERIAL AND A LIGHT SENSITIVE AROMATIC DIAZONIUM COMPOUND N AN AMOUNT SUFFICIENT SUCH THAT ITS PHOTODECOMPOSITION PRODUCTS RESULTING FROM SAID EXPOSURE WILL BE CAPABLE OF INHIBITING THE POLYMERIZATION OF SAID MONOMER WHEN CONTACTED WITH A RECOX SYSTEN COMPRISING (1) A SALT OF A DIVALENT MATERIAL WHICH, IN ITS LOWER OXIDIZED STATE, IS IN THE DIVALENT STATE, AND (2) A PER COMPOUND HAVING THE GROUUPING -O-O; CONTACTING SAID EXPOSED PHOTOGRAPHIC ELEMENT WITH SAID REDOX SYSTEM AND A SOLVENT THEREFOR SO AS TO EFFECT POLYMERIZATION IN THE UNEXPOSED AREAS ONLY, THE POLYMERIZATION OF THE EXPOSED AREAS BEING INHIBITED BY SAID DECOMPOSITION PRODUCTS OF THE DIAZONIUM COMPOUND, AND THEREAFTER REMOVING THE UNPOLYMERIZED PHOTOSENSITIVE COMPOSITION IN THE EXPOSED AREAS TO YIELD A POSITIVE RESIST.

Claim 2

A METHOD OF PRODUCING DIRECT POSITIVE PHOTOGRAPHIC POLYMERIC RESIST IMAGES WHICH COMPRISES SUBJECTING TO A SINGLE IMAGEWISE EXPOSURE WITH RADIANT ENERGY IN THE SPECTRAL REGION OF ULTRA VIOLET TO VISIBLE LIGHT A PHOTOGRAPHIC ELEMENT COATED ON A SUITABLE SUPPORT IN THE FORM OF A LAYER COMPRISING AN ETHYLENICALLY UNSATURATED WATER SOLUBLE MONOMER CONTAINING THE TERMINAL GROUPING CH=C= WHICH IS DIRECTLY ATTACHED TO A NEGATIVE GROUP, A HYDROPHILIC PHOTOGRAPHIC COLLODIAL CARRIER MATERIAL AND A LIGHT SENSITIVE AROMATIC DIAZONIUM COMPOUND N AN AMOUNT SUFFICIENT SUCH THAT ITS PHOTODECOMPOSITION PRODUCTS RESULTING FROM SAID EXPOSURE WILL BE CAPABLE OF INHIBITING THE POLYMERIZATION OF SAID MONOMER WHEN CONTACTED WITH A RECOX SYSTEN COMPRISING (1) A SALT OF A DIVALENT MATERIAL WHICH, IN ITS LOWER OXIDIZED STATE, IS IN THE DIVALENT STATE, AND (2) A PER COMPOUND HAVING THE GROUUPING -O-O; CONTACTING SAID EXPOSED PHOTOGRAPHIC ELEMENT WITH SAID REDOX SYSTEM AND A SOLVENT THEREFOR SO AS TO EFFECT POLYMERIZATION IN THE UNEXPOSED AREAS ONLY, THE POLYMERIZATION OF THE EXPOSED AREAS BEING INHIBITED BY SAID DECOMPOSITION PRODUCTS OF THE DIAZONIUM COMPOUND, AND THEREAFTER REMOVING THE UNPOLYMERIZED PHOTOSENSITIVE COMPOSITION IN THE EXPOSED AREAS TO YIELD A POSITIVE RESIST.