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US3066053A Expired / Lapsed US ⏱️ 0.0 years remaining

Method for producing semiconductor devices

Assignee: GTE Sylvania Inc
•
Filing: 1960-02-01
•
Granted: 1962-11-27
•
Expires: 1980-02-01
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Abstract

No abstract record available.

Inventors

  • 👤 Robert E Hunt
  • 👤 Robert C Ingraham
  • 👤 William J Pietenpol

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-25 23:14
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/60; H10P50/64; H10P50/642; H10P95/00; Y; Y10; Y10S; Y10S438/00; Y10S438/942; Y10S438/944

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 111 words
THE METHOD OF PRODUCING SEMICONDUCTOR DEVICES INCLUDING THE STEPS OF PLACING A MASK HAVING A PLURALITY OF APERTURES THEREIN AT A PREDETERMINED DISTANCE FROM A SURFACE OF A BODY OF SEMICONDUCTOR MATERIAL, DEPOSITING A CONDUCTIVITY TYPE IMPARTING MATERIAL ON SAID SURFACE THROUGH EACH OF SAID PLURALITY OF APERTURES, THE CONDUCTIVITY TYPE IMPARTING MATERIAL DEPOSITED THROUGH EACH OF SAID APERTURES DEFINING A DIFFERENT ONE OF A LIKE PLURALITY OF FIRST REGION ON SAID SURFACE COATED BY SAID MATERIAL, HEATING TO CAUSE PENETRATION OF SAID MATERIAL INTO SAID BODY AT EACH OF SAID FIRST REGIONS, DEPOSITING A RESISTANT MATERIAL THROUGH EACH OF SAID PLURALITY OF APERTURES, THE RESISTANT MATERIAL DEPOSITED THROUGH EACH OF
Claim 2
Independent Claim 111 words
THE METHOD OF PRODUCING SEMICONDUCTOR DEVICES INCLUDING THE STEPS OF PLACING A MASK HAVING A PLURALITY OF APERTURES THEREIN AT A PREDETERMINED DISTANCE FROM A SURFACE OF A BODY OF SEMICONDUCTOR MATERIAL, DEPOSITING A CONDUCTIVITY TYPE IMPARTING MATERIAL ON SAID SURFACE THROUGH EACH OF SAID PLURALITY OF APERTURES, THE CONDUCTIVITY TYPE IMPARTING MATERIAL DEPOSITED THROUGH EACH OF SAID APERTURES DEFINING A DIFFERENT ONE OF A LIKE PLURALITY OF FIRST REGION ON SAID SURFACE COATED BY SAID MATERIAL, HEATING TO CAUSE PENETRATION OF SAID MATERIAL INTO SAID BODY AT EACH OF SAID FIRST REGIONS, DEPOSITING A RESISTANT MATERIAL THROUGH EACH OF SAID PLURALITY OF APERTURES, THE RESISTANT MATERIAL DEPOSITED THROUGH EACH OF

References Cited (Backward Citations)

US2759861A Cited
US2870050A Cited
US2968751A Cited
US2890395A Cited
US2970896A Cited
US2969296A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1965-11-26 1966-05-28 1966-11-27 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1969-11-26 1970-05-28 1970-11-27 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1973-11-26 1974-05-28 1974-11-27 $7700.00 Window Closed / Lapsed

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