US3053636A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Boron deposition method
Assignee: Individual
•
Filing: 1960-11-10
•
Granted: 1962-09-11
•
Expires: 1980-11-10
Abstract
No abstract record available.
Inventors
- 👤 Kenneth E Bean
- 👤 William E Medcalf
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-06 20:02
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/22; C23C16/28; C01; C01B; C01B35/00; C01B35/02; C01B35/023; C23C16/01; C30; C30B; C30B25/00; C30B25/02; C30B29/00; C30B29/02
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
179 words
THE METHOD OF DEPOSITING A LOW TEMPERATURE ALPHA RHOMBOHEDRAL DEPOSIT OF BORON ON A TANTALUM FILAMENT IN SUCH A MANNER THAT THE FILAMEMT CAN BE MECHANICALLY PULLED FROM THE DEPOSIT LEAVING THE DEPOSITED CYRYSTALS BAR INTACT AND UNBROKEN INCLUDING THE STEPS OF (1) OUT GASSING A REDUCTION CHAMBER CONTAINING THE TANTALUM FILAMENT WITH HYDROGEN AND THEN WITH HELIUM, (2) HEATING THE FILAMENT TO ABOUT 1200* C. IN A HELIUM ATMOSPHERE AND ALLOWING A STABILIZE THEREAT, (3) SIMULTANEOUSLY INTRODUCING HYDROGEN AND BORON TRIBROMIDE VAPOR INTO THE REDUCTION CHAMBER, (4) STABILIZING THE TEMPERATURE AT ABOUT 1100* C. FOR 24-34 MINUTES, (5) INCREASING TO AND THEN STABILIZING THE TEMPERATURE AT ABOUT 1150* C. FOR 24-34 MINUTES WHILE INCREASING THE MOLE RATIO OF BORON TRIBROMIDE VAPOR FROM ABOUT 4.8 TO 7.2 MOLE PERCENT UP TO ABOUT 6.4 TO 9.6 MOLE PEERCENT, AND (6) RAISING THE TEMPERATURE TO ABOUT 1175* C. WHILE STOPPING THE HELIUM FLOW, INCREASING THE MOLE RATIO OF BORON TRIBROMIDE UP TO ABOUT 8 TO 12 MOLE PERCENT AND HOLDING UNDER THESE CONDITIONS FOR FROM 24-34 MINUTES UP TO 48-72 MINUTES.
Claim 2
Independent Claim
179 words
THE METHOD OF DEPOSITING A LOW TEMPERATURE ALPHA RHOMBOHEDRAL DEPOSIT OF BORON ON A TANTALUM FILAMENT IN SUCH A MANNER THAT THE FILAMEMT CAN BE MECHANICALLY PULLED FROM THE DEPOSIT LEAVING THE DEPOSITED CYRYSTALS BAR INTACT AND UNBROKEN INCLUDING THE STEPS OF (1) OUT GASSING A REDUCTION CHAMBER CONTAINING THE TANTALUM FILAMENT WITH HYDROGEN AND THEN WITH HELIUM, (2) HEATING THE FILAMENT TO ABOUT 1200* C. IN A HELIUM ATMOSPHERE AND ALLOWING A STABILIZE THEREAT, (3) SIMULTANEOUSLY INTRODUCING HYDROGEN AND BORON TRIBROMIDE VAPOR INTO THE REDUCTION CHAMBER, (4) STABILIZING THE TEMPERATURE AT ABOUT 1100* C. FOR 24-34 MINUTES, (5) INCREASING TO AND THEN STABILIZING THE TEMPERATURE AT ABOUT 1150* C. FOR 24-34 MINUTES WHILE INCREASING THE MOLE RATIO OF BORON TRIBROMIDE VAPOR FROM ABOUT 4.8 TO 7.2 MOLE PERCENT UP TO ABOUT 6.4 TO 9.6 MOLE PEERCENT, AND (6) RAISING THE TEMPERATURE TO ABOUT 1175* C. WHILE STOPPING THE HELIUM FLOW, INCREASING THE MOLE RATIO OF BORON TRIBROMIDE UP TO ABOUT 8 TO 12 MOLE PERCENT AND HOLDING UNDER THESE CONDITIONS FOR FROM 24-34 MINUTES UP TO 48-72 MINUTES.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1965-09-10 | 1966-03-12 | 1966-09-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1969-09-10 | 1970-03-12 | 1970-09-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1973-09-10 | 1974-03-12 | 1974-09-11 | $7700.00 | Window Closed / Lapsed |