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US2983591A Expired / Lapsed US ⏱️ 0.0 years remaining

Process and composition for etching semiconductor materials

Assignee: Texas Instruments Inc
•
Filing: 1957-11-15
•
Granted: 1961-05-09
•
Expires: 1977-11-15
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Abstract

No abstract record available.

Inventors

  • 👤 Richard R Stead

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-28 11:07
CPC Classifications
H; H10; H10P; H10P50/00; H10P50/60; H10P50/64; H10P50/642; C; C09; C09K; C09K13/00; C09K13/04; C09K13/08

Claims Analysis

Total Claims: 2
Claim 1
Independent Claim 25 words
METHOD OF ETCHING A SURFACE OF AN ELECTRICAL SEMICONDUCTOR WHICH COMPRISES ETCHING SAID SURFACE IN A SOLUTION OF NITRIC ACID, HYDROFLUORIC ACID, AND SODIUM BORATE.
Claim 2
Dependent Claim 25 words
METHOD OF ETCHING A SURFACE OF AN ELECTRICAL SEMICONDUCTOR WHICH COMPRISES ETCHING SAID SURFACE IN A SOLUTION OF NITRIC ACID, HYDROFLUORIC ACID, AND SODIUM BORATE.

References Cited (Backward Citations)

US2794846A Cited
US2827367A Cited
US2805370A Cited
US2847287A Cited
US2871110A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1964-05-08 1964-11-07 1965-05-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1968-05-08 1968-11-07 1969-05-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1972-05-08 1972-11-07 1973-05-09 $7700.00 Window Closed / Lapsed

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