Electrochemical leak structure and method for producing same

Claim 1

AN ELECTROCHEMICAL LIQUID JUNCTION STRUCTURE COMPRISING: A GLASS WALL SEPARATING TWO ZONE AND HAVING A SMALL OPENING THERETHROUGH INTERCONNECTING SAID ZONES, THE GLASS OF SAID WALL SOFTENING AND BECOMING MOLDABLE IN A WORKING TEMPERATURE RANGE, AND A POROUS SINTERED PLUG IN SAID OPENING FORMED OF A MIXTURE OF SOLID PARTICLES AND PARTICLES OF GLASS SINTERABLE AT A TEMPERATURE WITHIN SAID WORKING TEMPERATURE RANGE OF THE GLASS OF SAID WALL, THE GLASS OF SAID MIXTURE BEING FUDIBLE WITH GLASS OF SAID WALL AT SAID TEMPERATURE WITHIN SAID WORKING TEMOERATURE RANGE, RANGE, THE GLASS OF SAID PLUG AT THE PERIPHERY THEREOF BEING FUSED TO THE GLASS FO SAID WALL, SAID SOLID PARTICLES BEING PARTICLES OF AN INERT MATERIAL INFUSIBLE AT SAID TEMPERATURE WITHIN SAID WORKING TEMPERATURE RANGE, SAID INERT MATERIAL BEING PHYSICALLY AND CHEMICALLY INERT AT SAID TEMPERATURE AND ELECTROCHEMICALLY INACTIVE IN THE SENSE THAT ITS PRESENCE PER SE IN THE MIXTURE INTRODUCES NO SPURIOUS POTENTIALS ACROSS THE LIQUID JUNCTION, THE RATIO OF GALSS TO INERT MATERIAL IN SAID POROUS PLUG RANGING FROM ABOUT 15:1 TO ABOUT 1:2.