US2861903A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of forming photoresistive coatings and composition
Assignee: Nouvelle De L'outillage R Et de la Radio-Industrie BV Ste
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Filing: 1953-11-03
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Granted: 1958-11-25
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Expires: 1973-11-03
Abstract
No abstract record available.
Inventors
- 👤 Heimann Walter
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 14:03
CPC Classifications
H; H10; H10F; H10F55/00; H10F71/00; H10F71/128; H10P; H10P95/00
Claims Analysis
Total Claims: 1
Claim 1
Independent Claim
95 words
THE METHOD OF FORMING PHOTORESISTIVE MATERIAL SENSITIVE TO NEAR INFRA-RED, VISIBLE AND NEAR ULTRA-VIOLET LIGHT, WHICH CONSISTS IN FORMING UPON THE SURFACE OF A DIELECTRIC PLATE A FILM OF CADMIUM SULFIDE BY VACUUM EVAPORATION, SAID FILM BEING OF A THICKNESS OF A FEW MICRONS, PLACING SAID FILM IN CONTACT WITH A MIXTURE OF MICROCRYSTALLINE POWDERS CONSISTING OF 90 PARTS OF PURE CADMIUM SULFIDE POWDER, 10 PARTS OF PURE SELENIUM, AND 10 PARTS OF CADMIUM SULFIDE CONTAINING 0.1 PART OF COPPER SULFIDE, AND HEATING SAID FILM AND SAID POWDERS TO A TEMPERATURE BETWEEN 500 AND 600*C.
References Cited (Backward Citations)
US2710813A
Cited
US2651700A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1961-11-24 | 1962-05-26 | 1962-11-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1965-11-24 | 1966-05-26 | 1966-11-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1969-11-24 | 1970-05-26 | 1970-11-25 | $7700.00 | Window Closed / Lapsed |