Process for the production of pure silicon in a coarse crystalline form

Claim 1

A PROCESS FOR THE PRODUCTION OF PURE 99.98+% SILICON IN A COARSE CRYSTALLINE AND LOOSELY COHERENT FORM WHICH COMPRISES MIXING A SEPARATELY HEATED, VAPOROUS STREAM OF A REDUCING METAL SELECTED FROM THE GROUP CONSISTING OF ZINC AND CADMIUM AT SUBSTANTIAL REACTION TEMPERATURE WITH A VAPOROUS SEPARATELY HEATED STREAM OF A TETRAHALIDE OF SILICON SELECTED FROM THE GROUP CONSISTING OF A CHLORIDE AND BROMIDE, ALSO AT A REACTION TEMPERATURE WITHIN A SILICA REACTION CHAMBER, THE WALLS OF WHICH ARE MAINTAINED AT A TEMPERATURE ABOVE THE DEW POINT OF THE REDUCING METAL AND OF THE DIHALIDE SALT BY-PRODUCT OF SAID REDUCING METAL FORMED IN THE PROCESS BUT NOT IN EXCESS OF A TEMPERATURE OF 1100* C., AND RECOVERING THE PURE CRYSTALLINE SILICON PRODUCT WHICH RESULTS.